Sumitomo Metal Mining Company, Ltd.

Murata Manufacturing Co., Ltd.

Tohoku Chemical Industries Co., Ltd.

Tohoku Chemical Industries, Ltd.

Masaya Yukinobu

Kenji Kato

Yoshihiro Otsuka

Yuki Murayama

Morikazu Kojima

Mitsuo Usuba

Hiroyuki Tanaka

Atsushi Tofuku

Junji Ishii

Yasuo Tsukui

Munekazu Kawata

Shingo Murakami

Takahito Nagano

Haruo Nishiyama

Toshiaki Terao

Yuji Watanabe

Yoshihiro Ohtsuka

Yoshiyuki Kunifusa

Yukiko Suekane

Yuki Kumagai

Midori Fujisaki

Takahiro Kamata

Tsutomu Tanimitsu

Kenji Adachi

Hiromitsu Takeda

Kennichi Fujita

Yoshiaki Matsumura

Atsushi Toufuku

Keiichi Orita

Shingo Suto

Minseob Shin

Atsushi Igari

Sadahiro Iida

Atsushi Yamanaka

Hiroko Inage

Provided is a nickel powder in which growth of the nickel hydroxide component into a plate-shaped crystal is suppressed in the oxide film, and the content of coarse particles containing plate-shaped nickel hydroxide is small, and provided is a method for manufacturing the nickel powder by a wet process in which the nickel powder can be produced further simply and easily. A nickel powder including: particles having a substantially spherical shape and a number average size of 0.03 μm to 0.4 μm; and an oxide film, on the particle surface, containing a basic salt of nickel hydroxide, wherein the content of coarse particles having a particle size of more than 0.8 μm is 200 mass ppm or less, and the content of coarse particles having a particle size of more than 1.2 μm is 100 mass ppm or less.

Nickel powder and method for producing nickel powder

To provide a fine nickel powder for an internal electrode paste of an electronic component, the nickel powder obtained by a wet method and having high crystallinity, excellent sintering characteristics, and heat-shrinking characteristics. The nickel powder is obtained by precipitating nickel by a reduction reaction in a reaction solution including at least water-soluble nickel salt, salt of metal nobler than nickel, hydrazine as a reducing agent, and alkali metal hydroxide as a pH adjusting agent and water; the reaction solution is prepared by mixing a nickel salt solution including the water-soluble nickel salt and the salt of metal nobler than nickel with a mixed reducing agent solution including hydrazine and alkali metal hydroxide; and the hydrazine is additionally added to the reaction solution after a reduction reaction initiates in the reaction solution.

Nickel powder, method for manufacturing nickel powder, internal electrode paste using nickel powder, and electronic component

The purpose of the present invention is to provide a process for producing nickel powder capable of obtaining fine nickel powder in wet process, and also, capable of decreasing content of impurities by medicament (additive) used in crystallization of nickel powder which is reduction reaction. 1. A process for producing nickel powder, comprising a crystallization step for obtaining nickel crystal powder by reduction reaction in reaction solution in which at least water-soluble nickel salt, reducing agent, alkali hydroxide, if necessary metal salt of metal more noble than nickel, and water are mixed, and which is blended with sulfur-containing compound in advance, wherein the reducing agent is hydrazine (N2H4), the sulfur-containing compound is a compound having any of sulfur-containing functional group structure represented by &#x2014;SH, sulfur-containing functional group structure represented by &#x2014;S&#x2014;S&#x2014;, sulfur-containing functional group structure represented by &#x2014;O&#x2014;S(&#x2550;S)(&#x2550;O)&#x2014;O&#x2014; at least in molecule, and a ratio (A) of substance quantity of the sulfur-containing compound and nickel in the reaction solution ((molar number of the sulfur-containing compound/molar number of nickel)*10) [molar ppm], an effective multiplication factor (B) of the sulfur-containing functional group of the sulfur-containing compound [magnification] (&#x2014;SH: 1, &#x2014;S&#x2014;S&#x2014;: 2, &#x2014;O&#x2014;S(&#x2550;S)(&#x2550;O)&#x2014;O&#x2014;: 1), and a ratio (C) of substance quantity of the metal salt of metal more noble than nickel and nickel ((molar number of metal salt of metal more noble than nickel/molar number of nickel)*10) [molar ppm] is in a range of 0.1&#x2264;A*B&#x2264;0.75C+30 (0&#x2264;C&#x2264;100).

Process for producing nickel powder

A process for producing nickel powder capable of obtaining inexpensive, and also, high-performance nickel powder, even when using wet process. A process for producing nickel powder, including a crystallization step for obtaining nickel crystal powder by reductive reaction in reaction solution in which at least water-soluble nickel salt, metal salt of metal more noble than nickel, reducing agent, alkali hydroxide, amine compound, and water are mixed, wherein the reducing agent to be mixed in the crystallization step is hydrazine, the amine compound is autolysis inhibitor of hydrazine, and contains two or more primary amino groups in molecule, or contains one primary amino group and one or more secondary amino groups in molecule, and ratio of molar number of the amine compound with respect to molar number of nickel in the reaction solution is in a range of 0.01 mol % to 5 mol %.

Provided is a method for producing a coating liquid for forming a transparent conductive film, capable of forming a transparent conductive film having excellent transparency and electrical conductivity using a wet-coating method. Disclosed is the method for producing a coating liquid for forming a transparent conductive film, the method including a heating and dissolution step and a dilution step, in which the conditions for heating and dissolution/reaction of the heating and dissolution step are such that the heating temperature is in the range of 130&#xb0; C.&#x2264;T&#x2264;180&#xb0; C., and the heating time is in the range shown in FIG.

Production method for coating liquid for formation of transparent conductive film

By using a coating method, which is a simple method of manufacturing a transparent conductive film at low cost, a transparent conductive film formed with heating at a low temperature, in particular, lower than 300&#xb0; C. with both of excellent transparency and conductivity and also with excellent film strength and a method of manufacturing this transparent conductive film are provided.

Method of manufacturing transparent conductive film, the transparent conductive film, element and transparent conductive substrate using the film, as well as device using the substrate

Provided is a method for producing surface-treated oxide particles which can be used in an active-material layer for a positive electrode or a negative electrode in a storage battery. Oxide particles in which an alkaline compound is contained in a part or the whole area of the surface of each of the particles are brought into contact with a gas containing a volatile acidic compound to produce a neutralization product by a gas phase reaction, thereby producing surface-treated oxide particles in which the neutralization product is contained. The alkaline compound comprises at least one compound selected from compounds respectively containing lithium (Li), sodium (Na) and magnesium (Mg), the volatile acidic compound comprises at least one compound selected from compounds respectively containing boron (B), phosphorus (P) and silicon (Si), and the oxide particles comprise an alkali-composited oxide containing at least one transition metal selected from manganese, cobalt, nickel, iron and titanium.

Method for producing surface-treated oxide particles, and oxide particles produced by said production method

Provided is a method for producing a transparent conductive film which is formed via a coating step, a drying step and a baking step, wherein the baking step is characterized in that the dried coating film containing the organic metal compound as the main component is baked by being heated to a baking temperature or higher, at which at least the inorganic component is crystallized, under an oxygen-containing atmosphere having a dewpoint of &#x2212;10&#xb0; C. or lower, whereby an organic component contained in the dried coating film is removed therefrom by a heat decomposition, a combustion or the combination thereof to thereby form a conductive oxide microparticle layer densely filled with conductive oxide microparticles containing the metal oxide as a main component.

Method for producing transparent conductive film, transparent conductive film, transparent conductive substrate and device comprising the same

By using a coating method, which is a method of manufacturing a transparent conductive film, with low-temperature heating lower than 300&#xb0; C., a transparent conductive film with excellent transparency, conductivity, film strength, and resistance stability and a method of manufacturing this film are provided. In the method of manufacturing a transparent conductive film, a heat energy ray irradiating step is a step of irradiating with the energy rays while heating under an oxygen-containing atmosphere to a heating temperature lower than 300&#xb0; C. to form the inorganic film, and the plasma processing step is a step of performing the plasma processing on the inorganic film under a non-oxidizing gas atmosphere at a substrate temperature lower than 300&#xb0; C. to promote mineralization or crystallization of the film, thereby forming a conductive oxide fine-particle layer densely packed with conductive oxide fine particles having a metal oxide as a main component.

Method of manufacturing transparent conductive film, the transparent conductive substrate using the film, as well as device using the substrate

Provided is a method of manufacturing a metal oxide film to be formed through the following processes: a coating process of forming a coating film on a substrate by using a coating liquid for forming metal oxide film containing any of various organometallic compounds; a drying process of making the coating film into a dried coating film; and a heating process of forming an inorganic film from the dried coating film under an oxygen-containing atmosphere having a dew-point temperature equal to or lower than &#x2212;10&#xb0; C.

Method of manufacturing metal oxide film

A process for producing a fine silver particle colloidal dispersion which can simply form conductive silver layers and antimicrobial coatings by screen printing or the like. The process is characterized by having a reaction step of allowing an aqueous silver nitrate solution to react with a mixed solution of an aqueous iron(II) sulfate solution and an aqueous sodium citrate solution to form an agglomerate of fine silver particles, a filtration step of filtering the resultant agglomerate of fine silver particles to obtain a cake of the agglomerate of fine silver particles, a dispersion step of adding pure water to the cake to obtain a first fine silver particle colloidal dispersion of a water system in which dispersion the fine silver particles have been dispersed in the pure water, and a concentration and washing step of concentrating and washing the first fine silver particle colloidal dispersion of a water system.

Process for producing fine silver particle colloidal dispersion, fine silver particle colloidal dispersion, and conductive silver film

A translucent conductive film-forming coating liquid that can form a translucent conductive film having excellent translucency and conductivity together with organic solvent resistance includes conductive oxide acicular powder dispersed in a solvent containing a binder resin, the glass transition point (Tg) of the binder resin being 120&#xb0; C. or more.

Translucent conductive film forming coating liquid, translucent conductive film, and dispersive type electroluminescent device

A compressed multilayered film for a flexible functional element includes a base film, a transparent conductive layer coated on one side of the base film, and a support layer with a low adhesion layer liner on an opposite side of the base film. The support layer is separable from the base film. The base film has a thickness of 3 to 25 &#x3bc;m, and the transparent conductive layer is composed mainly of conductive oxide microparticles and a binder matrix. The multilayered film is compressed to increase the filling density of the conductive microparticles in the transparent conductive layer.

Film with transparent conductive layer, flexible functional element and flexible dispersion-type electroluminescent element, and method for producing the same and electronic device by the use thereof

A dispersion-type EL element is a dispersion-type electroluminescent element with at least a transparent coating layer, a transparent conductive layer, a phosphor layer, a dielectric layer and a rear electrode layer sequentially formed on a base film surface. The transparent coating layer can be peeled off the surface of the base film. The transparent conductive layer is formed by applying a coating liquid composed mainly of conductive oxide particles and a binder on a surface of the transparent coating layer, applying compression processing to the applied layer and then curing the compressed layer.

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Chiba, Japan

Masaya Yukinobu