Hitachi, Ltd.

Masaya Tanuma

Yasuo Morooka

Shinya Tanifuji

Tetsuo Ito

Kazunari Kobayashi

Kazuya Kadota

Yoshiyuki Nakagomi

A photoresist process which comprises a process for spin-coating a substrate with a resist, a process for transferring a mask pattern onto the coated resist film followed by exposure, and a developing process for forming a pattern on the substrate after the pattern has been exposed. When the developed pattern of the resist pulsates with the increase or decrease of parameters in the process for applying resist, the value of the parameter is set to a value that corresponds to an extreme value of the pulsation.

Method of applying a resist

A gauge and tension control system for a tandem mill comprises a delivered strip thickness deviation calculating unit for detecting output strip thickness at each of rolling stands, a tension calculating unit for arithmetically determining interstand tensions between two adjacent rolling stands on the basis of armature currents of drive motors and rolling loads at every rolling stand, a memory unit supplied with the output from the delivered strip thickness deviation calculating unit and detecting rolling speed values to thereby produce input strip thicknesses at every rolling stand, an optimal control unit for arithmetically determining optimal speed control quantity and press-down control quantity on the basis of the outputs from the delivered strip thickness deviation calculating unit, the tension calculating unit, the memory unit and a rolling schedule, a speed controller for controlling the speeds of the roll drive motors in dependence on the speed control quantities and a press-down controller for controlling the screw-down position of the rolling stands in dependence on the associated press-down control quantity.

Gauge and tension control system for tandem rolling mill

In a tandem rolling mill consisting of at least a first rolling stand and a second rolling stand, the interstand tension is controlled by the steps of detecting the rolling force P.sub.10 and rolling torque G.sub.10 at the first rolling stand after a workpiece is fed into the nip between the rolls of the first rolling stand but before the workpiece is fed into the nip between the rolls of the second rolling stand, storing in a memory the ratio G.sub.10 /P.sub.10 representative of the reference torque arm value for the first rolling stand in a tension-free state, detecting the rolling forces P.sub.1B, P.sub.2B and rolling torques G.sub.1B, G.sub.2B at the respective rolling stands immediately after the workpiece is fed into the nip between the rolls of the second rolling stand, computing the reference torque arm value G.sub.20 /P.sub.20 for the second rolling stand in a tension-free state on the basis of these detected values, and controlling the rolling speed of the first or second rolling stand so that (G.sub.10 /P.sub.10) - (G.sub.1 /P.sub.1) representing the deviation of the torque arm value detected at the first rolling stand in rolling operation from the reference torque arm value G.sub.10 /P.sub.10 stored in the memory is equal to (G.sub.20 /P.sub.20) - (G.sub.2 /P.sub.2) representing the deviation of the torque arm value detected at the second rolling stand in rolling operation from the reference torque arm value G.sub.20 /P.sub.20, whereby the workpiece can be rolled tension-free.

Growing community of inventors

Hitachi, Japan

Masaya Tanuma