Canon Kabushiki Kaisha

Masaya Hisamatsu

Tsutomu Murakami

Hirofumi Ichinose

Yukie Ueno

Akio Hasebe

Satoshi Shinkura

Ippei Sawayama

Hiroyuki Tanaka

Masaaki Nakabayashi

Manami Tomizuka

An optical member includes a base material containing aluminum or aluminum alloy, a first layer including black porous aluminum oxide provided on the base material, and a second layer including aluminum oxide having a plurality of projection portions provided on the first layer.

Optical member, optical apparatus, imaging apparatus, and manufacturing method of optical member

An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the contact angle of the electrolyte to the object to be etched is not more than 70&deg;. This electrolytic etching method can etch the object in a non-contact manner, can reduce the cost, number of steps, and processing time, and can enhance the patterning accuracy.

Electrolytic etching method, method for producing photovoltaic element, and method for treating defect of photovoltaic element

An etching apparatus is described comprising a substrate holding segment for holding a substrate with a portion to be etched, an electrolytic bath for maintaining an electrolyte solution therein, a locomotive mechanism for moving the substrate holding segment in order to immerse the substrate held on the substrate holding segment in the electrolyte solution maintained in the electrolytic bath, and a counter electrode holding segment for holding a counter electrode having a pattern corresponding a desired etching pattern to be formed at the portion to be etched of the substrate. The counter electrode is positioned to oppose the substrate held on the substrate holding segment.

Etching apparatus

An electrode structure is constituted by a first electrode, and at least one second electrode providing a pair of opposite portions with a prescribed spacing therebetween at which the first electrode is disposed. The electrode structure is suitably used for electrolytic etching and is effective in providing an accurate etching pattern without damaging the surface of an etching object.

Electrode structure, electrolytic etching process and apparatus

A method for etching an object having a portion to be etched on the surface thereof, comprising a step of immersing said object in an electrolyte solution such that said object serves as a negative electrode; a step of arranging a counter electrode having a pattern corresponding to a desired etching pattern to be formed at said portion to be etched of said object in said electrolyte solution so as to maintain a predetermined interval between said counter electrode and said object, and a step of applying a direct current or a pulse current between said object and said counter electrode to etch said portion to be etched of said object into a pattern corresponding to said pattern of said counter electrode.

Growing community of inventors

Kawasaki, Japan

Masaya Hisamatsu