Toray Industries, Inc.

Masaya Asano

Hiroki Oosedo

Mitsuru Suezawa

Masuichi Eguchi

Kazutaka Tamura

Shigeyoshi Kanetsuki

Mutsuo Kataoka, Deceased

Tomoyuki Yuba

Kazutaka Kusano

Ken Kawamura

Masanao Isono

Shigeo Abiko

Yoichi Mori

Takao Kinashi

Tetuo Suzuki

Hideshi Nomura

Yoshiaki Takayama

Yoshihiro Ishikawa

Mayumi Kataoka, Legal Representative

An actinic radiation sensitive polymer composition containing

Actinic radiation sensitive polymer composition

A developer for quinonediazide/novlak positive electron beam resists including alkali metal ions, weak acid ions and a water soluble organic compound subject to the following conditions: 0.05.ltoreq.a.ltoreq.0.5, 0.07.ltoreq.bn.ltoreq.1.5 and a&lt;bn or a&gt;bn, wherein a is the concentration of the alkali metal in mol/kg, b is the concentration of the weak acid in mol/kg and n is the valence of the weak acid ions, and the concentration of the water soluble organic compound is 0.5 to 10 wt %, based on the total weight of the developer.

Quinonediazide/novolak positive electron beam resist developer

Positive electron beam resist composition containing cresolnovolak

Method of forming positive polyimide patterns

A photosensitive polyimide precursor composition containing as main ingredients a poly(amic acid) wherein at least one molecular end is esterified with an alcohol, a compound containing carbon-carbon unsaturation having photoreactivity, and a photopolymerization initiator. The photosensitive polyimide precursor composition of the present invention can be prepared without the formation of any harmful by-product. When film formed from this composition is masked for patterning and then subjected to exposure and development using a developer, the amount of exposed portion dissolved in the developer until unexposed portion is dissolved off by the developer, is small and so it is possible to obtain a thick pattern. Further, by heat-treating this pattern, there can be obtained a thick polyimide pattern.

Photosensitive polyimide precursor compositions and process for

The present invention is concerned with a printing plate of which image formation is done by photoirradiation, having a front side covered waith a peelable or removable protective layer which contains a photofading material. The printing plate is safe against fogging to light and can be used under ordinary illumination.

Printing plate

A dry planographic plate has an image area and a non-image area in the shape of an image. The non-image area is constituted by a silicone rubber layer. The surface of the plate is coated with a thin film containing an organic polymer.

Dry planographic plate with silicon rubber layer and organic polymer

Developing a dry planographic printing plate using a propylene oxide derivative.

Method of making a dry planographic printing plate

A presensitized dry planographic printing plate comprising a base layer, a photo-sensitive layer and a silicone rubber layer, characterized in that the photo-sensitive layer contains an effective amount of an organic acid.

Dry planographic printing plate with organic acid additive

Growing community of inventors

Shiga, Japan

Masaya Asano