Matsushita Electric Industrial Co., Ltd.

Chisso Corporation

Jnc Corporation

Masatsugu Yamaguchi

Hiroshi Sakakima

Eiichi Hirota

Toru Tanaka

Harufumi Senno

Satoshi Hayashida

Minoru Yasueda

Shuichi Honda

Michio Matsuoka

Mikio Matsuura

Yukihiro Yanagiuchi

Takeshi Masuyama

Nobuji Nishi

Tsuneo Inoue

In the production process of the present invention for high purity polycrystal silicon, using a vertical reactor having a silicon chloride gas-feeding nozzle and a reducing agent gas-feeding nozzle which are disposed at an upper part and a waste gas discharge pipe, a silicon chloride gas and a reducing agent gas are fed into the reactor to form polycrystal silicon at a tip part of the silicon chloride gas-feeding nozzle by the reaction of the silicon chloride gas with the reducing agent gas, and the polycrystal silicon is allowed to grow from the tip part of the silicon chloride gas-feeding nozzle toward a lower part thereof.

Production process for high purity polycrystal silicon and production apparatus for the same

In amorphous materials including at least one iron-transition metal of Fe, Co, and Ni, and at least one metalloid of B, C, Si, and P, excellent magnetic characteristics can be provided subject to the condition that 0.5 to 10 atomic % of the above-described iron-transition metals are substituted by Mn. In addition, when the amorphous material partially substituted with Mn as described above is further comprised of at least one element selected from Groups IIIa, IVa, Va, and VIa in the periodic table, the crystallization temperature is considerably raised.

Amorphous materials with improved properties

A method of heat treatments of amorphous alloy ribbons comprises the sequential steps of; grinding amorphous alloy ribbon continuously fed at a predetermined speed (V) selectively varied in the range of 1 cm/sec.ltoreq.V.ltoreq.50 cm/sec, to uniformly finish the ribbon, and successively, heat-treating the ribbon with its surface contacting a stationary or rotating heating body having a surface temperature (T) defined in the range of (T.sub.cry -200.degree. C.).ltoreq.V.ltoreq.(T.sub.cry +50.degree. C.), where T.sub.cry is a crystallization point temperature of the alloy, to uniformly enhance the magnetic properties of the ribbon, and to remove the specific curlings inherently caused by so-called splat cooling manufacturing method, without causing any developments of brittleness of the ribbon mentioned above.

Method of heat treatments of amorphous alloy ribbons

This invention provides a humidity sensor having a negative coefficient of resistivity for relative humidity, which comprises 99.99 to 10 mole percent of iron oxide (Fe.sub.2 O.sub.3) and 0.01 to 90 mole percent of at least one member selected from alkali metal oxides, which are lithium oxide (Li.sub.2 O), sodium oxide (Na.sub.2 O), potassium oxide (K.sub.2 O) and cesium oxide (Cs.sub.2 O). The amount of the alkali metal oxide in the sensor is preferably 0.01 to 25 mole percent. This sensor is advantageous because it can accurately detect the changes in humidity and it has a long, stable life.

Humidity sensor

Growing community of inventors

Kumamoto, Japan

Masatsugu Yamaguchi