Fujimi Incorporated

Masatoshi Tomatsu

Shuhei Takahashi

The present invention provides a polishing composition for use in polishing a material having a Vickers hardness of 1500 Hv or higher. The polishing composition has an oxidation-reduction potential ORPmV and the material to be polishing has an oxidation-reduction potential ORPmV, with their relation satisfying ORP&#x2212;ORP&#x2265;100 mV.

Polishing composition

Provided is a method for polishing a material having a Vickers hardness of 1500 Hv or higher. The polishing method comprises a step of carrying out preliminary polishing using a preliminary polishing composition that comprises an abrasive Aand a step of carrying out final polishing using a final polishing composition that comprises an abrasive Alower in hardness than the abrasive A.

Polishing method and polishing composition

Provided is a polishing composition capable of keeping a good polishing removal rate stably. The polishing composition includes silica particles as abrasives and a basic compound as a polishing removal accelerator. The silica particles have a density of silanol groups that is 1.5 to 6.0 pieces/nm. The polishing composition has an adsorption ratio parameter A that is 1.2 or less, the adsorption ratio parameter representing concentration dependency of an amount of adsorption of the basic compound to the silica particles as the ratio of high-concentration adsorption amount/low-concentration adsorption amount.

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Kiyosu, Japan

Masatoshi Tomatsu