Osg Corporation

Tohoku University

Masatoshi Sakurai

Mei Wang

Hiroaki Sugita

Junichi Koike

Yuji Sutou

Takaomi Toihara

Toshihiro Ohchi

Takahiro Yamamoto

Yasuo Fukui

Masuo Saitoh

Shoko Komiyama

Kenichiro Yamakawa

A hard film for coating a surface of a base material, the hard film includes a layer A, a layer B, and a nanolayer-alternating layer. The layer A is an AlTiCr nitride of (AlTiCr&#x3b1;)N, where &#x3b1; is one or more elements selected from C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The layer B is an AlTiCr nitride or AlTiCr carbonitride of (AlTiCr&#x3b2;)CN, where &#x3b2; is one or more elements selected from B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or B. And, the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride of [AlCr(SiC)&#x3b3;]CN, where &#x3b3; is one or more elements selected from B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W.

Hard coating and member coated with hard coating

A hard coating, which is to be disposed to cover a surface of a substrate, has a total thickness of 0.5-20 &#x3bc;m, and includes an A layer and nanolayer-alternated layer that are alternately laminated by physical vapor deposition. The nanolayer-alternated layer includes a B layer and a C layer that are alternately laminated. The A layer has a thickness of 50-1000 nm and is AlCr nitride that is represented by a composition formula of [AlCr]N wherein an atomic ratio U is 0.20-0.80. The B layer has a thickness of 1-100 nm and is TiAl nitride that is represented by a composition formula of [TiAl]N wherein an atomic ratio W is 0.30-0.85. The C layer has a thickness of 1-100 nm and is TiSi nitride that is represented by a composition formula of [TiSi]N wherein an atomic ratio Y is 0.05-0.45. The nanolayer-alternated layer has a thickness of 50-1000 nm.

Hard coating and hard coating-covered member

A hard coating, which is to disposed to cover a surface of a tool substrate, has a total thickness of 0.5-20 &#x3bc;m and includes an A layer and nanolayer-alternated layer that are alternately laminated by physical vapor deposition. The nanolayer-alternated layer includes a B layer and C layer that are alternately laminated. The A layer has a thickness of 50-1000 nm and is AlCr(SiC) nitride that is represented by a composition formula of [AlCr(SiC)]N wherein an atomic ratio W is 0.20-0.80 and an atomic ratio X is 0.01-0.20. The B layer has a thickness of 1-100 nm and is TiAl nitride that is represented by a composition formula of [TiAl]N wherein an atomic ratio Y is 0.30-0.85. The C layer has a thickness of 1-100 nm and is Ti(SiC) nitride represented by a composition formula of [Ti(SiC)]N wherein an atomic ratio Z is 0.05-0.45. The nanolayer-alternated layer has a thickness of 50-1000 nm.

A hard lubrication film, with which a surface of a base material is coated, has two or more alternately laminated layers that are one or more A-layers made of (CrMoWVB)CNand one or more B-layers made of (CrMoWVB)CNO. Atom ratios a, b, c, d, e=1&#x2212;a&#x2212;b&#x2212;c&#x2212;d, x+y, and y related to A-layers satisfy 0.2&#x2264;a&#x2264;0.7, 0.05&#x2264;b&#x2264;0.6, 0&#x2264;c&#x2264;0.3, 0&#x2264;d&#x2264;0.05, 0&#x2264;e&#x2264;0.05, 0.3&#x2264;x+y&#x2264;0.6, and 0&#x2264;y&#x2264;0.6, respectively. Atom ratios a, b, c, d, e=1&#x2212;a&#x2212;b&#x2212;c&#x2212;d, x, y, z, and x+y+z related to B-layers satisfy 0.2&#x2264;a&#x2264;0.7, 0.05&#x2264;b&#x2264;0.6, 0&#x2264;c&#x2264;0.3, 0&#x2264;d&#x2264;0.05, 0&#x2264;e&#x2264;0.05, 0&#x2264;x&#x2264;0.6, 0&#x2264;y&#x2264;0.6, 0&#x3c;z&#x2264;0.6, and 0.3&#x2264;x+y+z&#x2264;0.6, respectively. Each A-layer has a film thickness within a range of 2 nm or more to 1000 nm or less, each B-layer has a film thickness within a range of 2 nm or more to 500 nm or less, and wherein the hard lubrication film has a total film thickness within a range of 0.1 &#x3bc;m or more to 10.0 &#x3bc;m or less.

Hard lubricating coating film and hard lubricating coating film-covered tool

A tool hard film that is to be disposed as coating on a surface of a tool, the tool hard film being a TiCrMoWV oxycarbide, oxynitride, or oxycarbonitride having a phase with a NaCl-type crystal structure as a main phase, the oxycarbide, oxynitride, or oxycarbonitride having fine crystals due to introduction of oxygen.

Hard film for machining tools and hard film-coated metal machining tool

A hard coating for a cutting tool being highly resistant to both wear and seizure; and a cutting tool coated with the hard coating. This hard coating is a multilayer film including two or more of the following layered in alternation: first coating layers including AgCu; and second coating layers including a nitride, oxide, carbide, carbonitride, or boride containing at least one element selected from among group IVA, VA, and VIA elements, aluminum, and silicon. Since the atomic proportion for the first coating layers is between 0.2 and 0.4, inclusive, the layering pitch of the first and second coating layers is between 0.2 and 100 nm, inclusive, and the total thickness is between 0.2 and 10.0 &#x3bc;m, inclusive, the coefficient of friction and cutting resistance can be reduced by the inclusion of silver in the coating, and provide a hard coating that exhibits superb lubricity and resistance to seizure.

Hard coating for cutting tool, and cutting tool coated with hard coating

A hard laminar coating having a first 61 m and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein the first film is a carbide, a nitride, a carboxide, a nitroxide, a carbonitride or a carbo-oxynitride of (AlCrB), while the second film is TiB, the hard laminar coating configured to include atomic ratios a, b and c in the first film satisfying a=1&#x2212;b&#x2212;c, 0.2&#x2266;b&#x2266;0.7, and 0&#x3c;c&#x2266;0.2, and a thickness of the first film being no less than 0.1 &#x3bc;m and no more than 5.0 &#x3bc;m, while a thickness of the second film being no less than 0.1 &#x3bc;m and no more than 5.0 &#x3bc;m, and to have a total thickness of no less than 0.2 &#x3bc;m and no more than 10.0 &#x3bc;m, and the hard laminar.

Hard laminar coating

A hard multilayer coating that is to be disposed on a body, including: (a) a first coating layer disposed to be held in contact with the body, the first coating layer consisting of TiAlCrXN(wherein 'X' represents carbon or oxygen, and 'a' represents a mixed crystal ratio satisfying 0.5&#x2266;a&#x2266;1); (b) a second coating layer disposed on the first coating layer, the second coating layer being provided by a mixture layer consisting of TiAlCrXN(wherein &#x201c;b&#x201d; represents a mixed crystal ratio satisfying 0.5&#x2266;b&#x2266;1) and TiAl(SiC)XN(wherein &#x201c;c&#x201d; represents a mixed crystal ratio satisfying 0.5&#x2266;c&#x2266;1), or provided by a multilayer including a first sublayer consisting of the TiAlCrXNand a second sublayer consisting of the TiAl(SiC)XN, which are alternately superposed on each other; and (c) a third coating layer disposed on the second coating layer and constituting an outermost layer of the hard multilayer coating, the third coating layer consisting of TiAl(SiC)XN(wherein &#x201c;d&#x201d; represents a mixed crystal ratio satisfying 0.5&#x2266;d&#x2266;1).

Hard multilayer coating, and hard multilayer coated tool including the hard multilayer coating

A process of manufacturing a coated body including a substrate and a hard coating disposed on the substrate, wherein the hard coating has (a) a surface smoothed to have a roughness with maximum height Rz of not larger than 1.2 &#x3bc;m, and (b) recesses each of which has a size of 0.5&#x2013;6.0 &#x3bc;m and is formed in the surface, the process including a surface smoothing step of smoothing a surface of the hard coating by using abrasive particles such that the smoothed surface has the roughness with the maximum height Rz of not larger than 1.2 &#x3bc;m and such that the recesses each having the size of 0.5&#x2013;6.0 &#x3bc;m are formed in the surface of the hard coating, wherein each of the abrasive particles used in the surface smoothing step is provided by a spherical-shaped core body made of a rubber and having a particle size of 0.1&#x2013;2.0 mm, and hard abrasive grains each having a size of #3000&#x2013;#10000 and adhering to an outer surface of the spherical-shaped core body.

Process of manufacturing a coated body

A method of smoothing a surface of a diamond coating of a diamond-coated body, by using an arc-type ion plating device in which at least one target is disposed. The method includes: (a) a step of causing arc discharge between an anode, and a cathode which is provided by each of the above-described at least one target, whereby positive ions are emitted from the above-described at least one target; and (b) a step of applying a negative bias voltage to the diamond-coated body which is disposed in the arc-type ion plating device, whereby the surface of the diamond coating is bombarded with the positive Lions, so as to be smoothed by the bombardment of the positive ions against the surface of the diamond coating.

Method of smoothing diamond coating, and method of manufacturing diamond-coated body

A hard multilayer coated tool including: (a) a substrate; and (b) a multilayer coating covering the substrate, the multilayer coating comprising first and second coating layers which are alternately laminated on the substrate, each of the first coating layers having and average thickness of 0.10-0.50 &mgr;m and containing titanium therein, each of the second coating layers having and average thickness of 0.10-0.50 &mgr;m and containing aluminum therein, the multilayer coating having and average thickness of 0.50-10.0 &mgr;m.

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Toyokawa, Japan

Masatoshi Sakurai