Hitachi High-Tech Corporation

Masatoshi Kawakami

Tsutomu Nakamura

Kohei Sato

Yasushi Sonoda

Masahiro Nagatani

Hideki Kihara

Hironori Kusumoto

Hiroho Kitada

Hidenobu Tanimura

Makoto Kashibe

In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20&#xb0; C. to 25&#xb0; C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.

Plasma processing apparatus

A plasma processing method for efficiently processing a wafer using plasma which includes two processing steps and a bridging step between the two processing steps. The plasma processing method includes: supplying a processing-use gas into a processing chamber during a processing step; supplying a bridging-use gas into the processing chamber during a bridging step; switching the supply of the processing-use gas from a first gas supply unit and the bridging-use gas from a second gas supply unit to the processing chamber in transition between the two processing steps and the bridging step; and regulating a flow rate of the bridging-use gas to be supplied during the bridging step to a flow rate regarded equal to a supply amount of the processing-use gas to be supplied during a succeeding processing step out of the two processing steps.

Plasma processing apparatus and plasma processing method

Growing community of inventors

Tokyo, Japan

Masatoshi Kawakami