Nikon Corporation

Komatsu Corporation

Japan Tobacco Inc.

Masatoshi Ikeda

Tetsuo Takahashi

Yasuhiro Omura

Masato Hatasawa

Shiwen Li

Wataru Sumino

Yutaka Ichihara

Akira Miyaji

Daisuke Kozuka

Shinobu Nagura

Yuji Yamauchi

Akira Hasebe

Yuuki Yokoyama

A control method of an excavator including: a first circuit of an open circuit including a main valve controlling inflow of hydraulic oil from a main pump to a working equipment cylinder, and a tank to which the oil flowed out of the cylinder is ejected via the main valve; a second circuit of a closed circuit including a first valve between swing pump and motor; and a second valve on a first passage between the main valve and the tank, adjusting back pressure of the main valve, the control method includes: causing the oil to flow into a second passage around a spool of the first valve from an upstream portion of the first passage between the main valve and the second valve; and causing the oil to flow out of the second passage to a downstream portion of the first passage between the second valve and the tank.

Hydraulic system, excavator, and control method of excavator

An excavator includes: a swing motor driven by oil from a swing pump coupled to a power take-off and driven by an engine; a first main oil passage connecting a first discharge port of the swing pump and a first suction port of the swing motor; a second main oil passage connecting a second discharge port of the swing pump and a second suction port of the swing motor; a neutral retention valve disposed in the first main oil passage and the second main oil passage and controlling passage of oil; a regenerative energy absorbing device coupled to the power take-off and absorbs regenerative energy generated by oil from the swing motor to the swing pump via a meter-out opening of the neutral retention valve; and a valve control section controlling an area of the meter-out opening based on a state of the regenerative energy absorbing device.

Excavator and method of controlling excavator

The present invention relates to a projection exposure apparatus ( ) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M ) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

Projection exposure apparatus and method

A projection exposure apparatus for transferring a pattern on a mask onto a substrate, including a projection optical system having a first reflection optical element for bending an optical axis, a first optical system arranged between the mask and the first reflection optical element, and a second optical system arranged between the first reflection optical element and the substrate; a frame for integrally supporting a first barrel for holding the first optical system and a second barrel for holding the second optical system, and a connecting member for connecting the first barrel and the second barrel at positions different from the frame.

Support structure for a projection exposure apparatus and projection exposure apparatus having the same

The present invention relates to a projection exposure apparatus (,) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

A holder improving the optical performance of a reflecting optical member in a projection optical system which projects an image of a pattern formed on a mask onto a photosensitive substrate, and an exposure apparatus having the holder. A support mechanism supports a back surface of the reflecting optical member, which is reverse to a reflecting surface thereof, at at least three points. The support points are positioned on a circumference away from the center of the reflecting surface by a distance at least 0.6 times the distance from the center of the reflecting surface to the outer periphery of the reflecting optical member such that the support points are circumferentially spaced along the circumference at equal intervals. Alternatively, a holding member supports the reflecting optical member and forms a closed chamber in combination with the reflecting optical member. The pressure in the closed chamber at the back of the reflecting surface of the reflecting optical member is regulated to a predetermined level. The reflecting optical member is integrally formed with a mounting portion which is secured to the projection optical system.

Holder for reflecting member and exposure apparatus having the same

The exposure projection apparatus includes an illumination system which illuminates a mask with a light beam, and a optical projection system which projects the image of a pattern formed on the mask onto a substrate. The optical projection system includes a first barrel which holds a plurality of optical elements, at least three second barrels, each holding at least one optical element disposed between the mask and the first barrel, so that the coma, astigmatism, and distortion of the optical projection system can be adjusted, and a first optical element which is disposed between the substrate and the first barrel so that either the spherical aberration or curvature of field of the optical projection system, or both, can be adjusted.

Exposure projection apparatus

Four specified lenses 22.sub.1 to 22.sub.4 of a plurality of lenses in a projection optical unit are subjected to special processing (astigmatic surface processing) so that asymmetric component aberration relative to an optical axis is generated. Each of the lenses 22.sub.1 to 22.sub.4 is held by each of secondary lens frames 20 set in each of primary lens frames 14. Each of the secondary lens frames 20 is constructed so that it can be rotated from the outside of a lens barrel 12. The asymmetric component aberration relative to the optical axis of an optical system comprising all lenses for constituting the projection optical unit 10 can be easily corrected by rotating a pair of two of the lenses 22 subjected to the astigmatic surface processing. The projection optical unit is used for a projection exposure apparatus.

Projection optical unit and projection exposure apparatus comprising the

A projection type exposure apparatus is provided for illuminating a mask formed with a pattern with an illumination light having a predetermined wavelength area and forming an image of the pattern on a substrate through a projection optical system. This apparatus comprises a projection optical system incorporating a plurality of lens barrel units each housing one or more optical elements. Each lens barrel unit is so mounted in the projection optical system as to be attachable thereto and detachable therefrom.

Projection type exposure apparatus and method with detachable and

A lens barrel holding apparatus for fixing a lens barrel having at least one optical element. The apparatus fixes a lens barrel to a lens barrel holding bed. The lens barrel has a flange portion formed along the circumferential direction of the outer peripheral portion of the lens barrel. The lens barrel holding bed has a cylindrical recess of a diameter larger than the outer diameter of the flange portion. The apparatus includes a plurality of bar-like first supporting members for coupling the bottom surface of the recess and the flange portion together. Also included is a second supporting member that has at least three bar members disposed on the upper part of the flange portion along the circumferential direction of the flange portion so as to surround the lens barrel. The at least three bar members are coupled to the flange portion and to the lens barrel holding bed.

Apparatus for holding a lens barrel for providing accurate lens

An exposure apparatus is for illuminating a pattern on a mask by an illumination optical system to transfer the pattern on the mask onto a photosensitive substrate set on a stage through a projection optical system. The exposure apparatus comprises a first supply device for supplying an inert gas toward the photosensitive substrate substantially in parallel with the optical axis of the projection optical system in a space open to communicate with the atmosphere between the projection optical system and the photosensitive substrate, and a second supply device for supplying the inert gas to the space in a direction intersecting with the optical axis of the projection optical system so as to establish an inert gas atmosphere in the space together with the first supply device. The transfer is conducted in the inert gas atmosphere.

Growing community of inventors

Tokyo, Japan

Masatoshi Ikeda