Tokyo Ohka Kogyo Co., Ltd.

Fujitsu Corporation

Fuji Xerox Co., Ltd.

National Institute of Advanced Industrial Science and Technology

Masatoshi Arai

Yoshitaka Komuro

Yoshiyuki Utsumi

Koshi Onishi

Koichi Murakami

Daiju Shiono

Takaya Maehashi

Ryosuke Miyata

Takuya Ikeda

KhanhTin Nguyen

Tomoyuki Hirano

Takahiro Dazai

Daichi Takaki

Takashi Nagamine

Daisuke Kawana

Hiroto Yamazaki

Nobuhiro Michibayashi

Junichi Tsuchiya

Junichi Miyakawa

Tsuyoshi Nakamura

Akiya Kawaue

Jun Iwashita

Tatsuya Fujii

Kenta Suzuki

Masanori Kubo

Mari Murata

Masahiro Shiosaki

Takatoshi Inari

Taku Hirayama

Masahiko Sugimura

Masahito Yahagi

Akiyoshi Yamazaki

Takashi Kamizono

Kensuke Matsuzawa

Soichi Nishiyama

Shogo Matsumaru

Naoto Motoike

Kazuishi Tanno

Yuta Iwasawa

Satoshi Maemori

Kenri Konno

Takaaki Kaiho

Yosuke Suzuki

Ryoji Kawasaki

Shinji Kumada

Sho Kataoka

Kiwamu Sue

Yoshinori Aoyama

Yusuke Yoshigoe

A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mrepresents an m-valent organic cation, Rrepresents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of 'n+p≤(q×2)+5' is satisfied.

Resist composition, method of forming resist pattern, and compound

A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formulae (a0-1) and one or more compounds selected from the group consisting of a compound (B01) represented by General Formula (b0-1) and a compound (B02) represented by General Formula (b0-2), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or the like, Rxrepresents an acid dissociable group, Rand Rrepresents an aryl group having a fluorine atom, R, R, and Rrepresents an aryl group or the like which may have a substituent, and Xand Xrepresents a counter anion

Resist composition and method of forming resist pattern

A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, which contains a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or a divalent linking group, Rarepresents a cyclic acid dissociable group, q represents an integer in a range of 0 to 3, and n represents an integer of 1 or more, provided that n&#x2264;q&#xd7;2+4 is satisfied

Resist composition, method of forming resist pattern, compound, and resin

An alternating copolymer including a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) represented by general formula (a0-2) in which Rprepresents a hydrogen atom or the like; Vprepresents a single bond or a divalent linking group; Rpand Rpeach independently represents a hydrocarbon group which may have a substituent, or Rpand Rpare mutually bonded to form a ring; Rprepresents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; Rprepresents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a cyano group or a hydroxy group; Rprepresents a linear or branched aliphatic hydrocarbon group; and m represents an integer of 0 to 4

Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern

A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1). In the formula, Wrepresents a polymerizable group-containing group, Crepresents a tertiary carbon atom, and Xrepresents a group that forms a monocyclic or polycyclic alicyclic group together with C, Rato Rarepresents a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Rato Raare bonded to each other to form an aliphatic ring, not all of Rato Raare hydrogen atoms, n represents 0 or 1

Organically modified metal oxide nanoparticles containing two or more cores including a plurality of metal atoms and a plurality of oxygen atoms covalently bonded to the plurality of metal atoms; a first modifying group that is a ligand coordinated to each of the cores and selected from the group consisting of a carboxylic acid carboxylate, a sulfonic acid sulfonate, and a phosphonic acid phosphonate; and a second modifying group that is coordinated to each of the cores and is a ligand having a structure different from that of the first modifying group and/or an inorganic anion, in which organically modified metal oxide nanoparticles have a structure in which the cores are crosslinked through a coordinate bond by at least the first modifying group.

Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist composition, and resist pattern forming method

A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rxto Rxrepresents a hydrogen atom or a hydrocarbon group, or two or more of Rxto Rxmay be mutually bonded to form a ring structure; Ryand Ryrepresents a hydrogen atom or a hydrocarbon group, or Ryand Rymay be mutually bonded to form a ring structure; Rzto Rzrepresents a hydrogen atom or a hydrocarbon group, or two or more of Rzto Rzmay be mutually bonded to form a ring structure; provided that at least one of Rxto Rx, Ry, Ryand Rzto Rzhas an anionic group; and Mrepresents an m-valent organic cation).

A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), Wrepresents a polymerizable group-containing group, Crepresents a tertiary carbon atom, Rrepresents an unsaturated hydrocarbon group which may have a substituent, Rand Rrepresent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an &#x3b1;-position of Cconstitutes a carbon-carbon unsaturated bond. In General Formula (a02-1), Wrepresents a polymerizable group-containing group, Warepresents an aromatic hydrocarbon group, and n2 represents an integer in a range of 1 to 3

A resist composition including a compound represented by formula (b1) in which Rrepresents an aryl group which may have a substituent; Rand Reach independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a halogen atom, and at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a sulfonyl group; and Xrepresents a counteranion 

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

A resist composition that generates an acid upon exposure is soluble in a developing solution, and is changed by action of an acid. The resist composition contains a resin component having solubility in a developing solution, which is changed by action of an acid, and has a constitutional unit represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yaxrepresents a single bond or a linking group; Ax represents a sulfonyl group or a sulfoxide group; and Raxrepresents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group. In General Formula (a02-1), W represents a polymerizable group-containing group, Warepresents a cyclic group having an (n+1)-valent aromaticity, which may have a substituent, Wamay form a condensed ring with W, and nrepresents an integer of 1 to 3 

A resist composition that generates an acid upon exposure and has solubility in a developing solution, which is changed by action of an acid, the resist composition containing a resin component having a constitutional unit represented by General Formula (a01-1) and a constitutional unit represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yaxrepresents a linking group; Ax represents a sulfonyl group or a sulfoxide group; Raxrepresents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group; s0 and v0 represent an integer of 0 to 6; and 1&#x2264;s0+v0&#x2264;6 and u0&#x2264;s0+v0. In General Formula (a02-1), Rarepresents an acid-dissociable group represented by General Formula (a02-r2-1) 

A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Rarepresents an acid dissociable group; R, Rand Reach independently represents a hydrocarbon group containing an aromatic ring; R, Rand Reach independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; Rrepresents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M'represents an m-valent onium cation. 

A resist composition including a compound represented by formula (b1) in which Rrepresents an aryl group which may have a substituent; Rand Reach independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a halogen atom, and at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a sulfonyl group; and Xrepresents a counteranion. 

A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Varepresents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Yarepresents a carbon atom; Xarepresents a group which forms a cyclic hydrocarbon group together with Ya; Rarepresents a hydrocarbon group which may have a substituent; provided that at least one of Xaand Rahas a carbon atom constituting a carbon-carbon unsaturated bond at an &#x3b1;-position of Ya. 

Resist composition, method of forming resist pattern, polymeric compound, and compound

A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, the entire anion moiety may be an n-valent anion, and Mrepresents an m-valent organic cation 

Resist composition, and method of forming resist pattern

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Masatoshi Arai