Sharp Kabushiki Kaisha Corporation

Masatomo Honjo

Takuya Matsuo

Hiroshi Matsukizono

Izumi Ishida

A display device, includes: a first gate electrode; a lower insulating film; a lower gate insulating film including a metal oxide film; and an oxide semiconductor layer, all of which are provided on a substrate in a stated order; and a first transistor provided on the substrate and including the oxide semiconductor layer, the first transistor including one or more first transistors, the first transistor including: a first channel region; a first conductor region holding the first channel region; and the first gate electrode across the lower gate insulating film from the first channel region, and between the lower insulating film and the first gate electrode, a clearance being provided, and the clearance being filled with the lower gate insulating film.

Display device

A display device according to the disclosure includes a substrate, a first transistor provided on the substrate, and a second transistor provided on the substrate, not overlapping the first transistor. The first transistor includes a polycrystalline silicon layer provided on the substrate, a first insulating film provided on the polycrystalline silicon layer, a first gate electrode provided on the first insulating film, and a second insulating film provided on the first gate electrode. The second transistor includes an oxide semiconductor layer provided on the first insulating film, a third insulating film provided on the oxide semiconductor layer, and a second gate electrode provided on the third insulating film. The first and third insulating films are SiOx films. The second insulating film is an SiNx film including hydrogen, and is provided overlapping the polycrystalline silicon layer, and is provided not overlapping the oxide semiconductor layer.

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Sakai, Japan

Masatomo Honjo