Gigaphoton Inc.

Komatsu Corporation

Kabushiki Kaisha Komatsu Seisakusho

Seiki Hanbai Co., Ltd.

Komatsu Denshi Kinzoku Kabushiki Kaisha

Other

Nec Corporation

Masato Moriya

Osamu Wakabayashi

Tamotsu Abe

Takashi Suganuma

Toru Suzuki

Akira Sumitani

Hideyuki Wakai

Keiji Terada

Manabu Ando

Hideo Hoshino

Hiroshi Someya

Akira Endo

Krzysztof Nowak

Hirotsugu Toda

Takayuki Yabu

Takeshi Asayama

Georg Soumagne

Mitsuhiko Chino

Yoji Kamosawa

Hakaru Mizoguchi

Toshirou Kotooka

Hideyuki Hayashi

Tadayuki Hanamoto

Yoshifumi Ueno

Yukio Watanabe

Tatsuya Ariga

Hiroshi Komori

Miwa Igarashi

Keisuke Ishida

Hidenobu Kameda

Hiroaki Nakarai

Koji Shio

Yoshinobu Watabe

Kiyokazu Mizoguchi

Takashi Kusama

Masaki Nakano

Kouji Kakizaki

Hiroshi Tanaka

Toshihiro Nishisaka

Shigeo Morimoto

Teiichirou Chiba

Hiroshi Monden

Takeshi Ohta

Tooru Abe

Tatsuo Enami

Akihiko Kurosu

Akihiko Souda

Hiroyuki Masuda

Masashi Shinbori

Natsuhiko Kouno

Hirokazu Kubo

Yosuke Watanabe

Shuuji Karasawa

Tetsuya Iida

Toshio Hayashida

Kazuhiro Mimura

Hideyuki Ochiai

An energy measuring apparatus according to one aspect of the present disclosure includes a first beam splitter, a second beam splitter, a third beam splitter, and a fourth beam splitter, which sequentially reflect part of a main beam and input the beam to an energy sensor. The first beam splitter, the second beam splitter, the third beam splitter, and the fourth beam splitter are each arranged to have such an incident angle and a folding direction of an optical path as to suppress a change in detection value of the energy sensor due to a change in incident angle and a change in polarization purity of the main beam.

Energy measuring apparatus and excimer laser apparatus

A sensor degradation evaluation method according to an aspect of the present disclosure includes an evaluation step of evaluating degradation of at least one of a sensor for coarse measurement that receives interference fringes produced by a spectrometer for coarse measurement and a sensor for fine measurement that receives interference fringes produced by a spectrometer for fine measurement, and the evaluation step includes causing a plurality of kinds of laser light having wavelengths different from one another to be sequentially incident on the spectrometer for coarse measurement and the spectrometer for fine measurement and acquiring a coarse-measurement wavelength and a fine-measurement wavelength on a wavelength basis from a plurality of the received interference fringes, acquiring a degradation parameter on a wavelength basis from the coarse-measurement wavelength and the fine-measurement wavelength on a wavelength basis, and comparing the degradation parameter on a wavelength basis with a threshold.

Sensor degradation evaluation method

There is provided a screen guide that engages a support rail or is detachable from the support rail at an intermediate position on the support rail. The support rail supports the screen guide and includes first and second engagement edges, and the screen guide is formed by connecting a plurality of guide pieces to one another in series. Each of the guide pieces includes a piece body that engages an end portion of a screen and an engagement member that includes first and second engagement portions that engage the first and second engagement edges of the support rail, respectively. Each of the engagement members is coupled to the corresponding piece body such that the engagement member is capable of being displaced to a first position at which the first and second engagement portions engage the first and second engagement edges, respectively, and to a second, detached position.

Screen device

An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.

Excimer laser apparatus and electronic-device manufacturing method

Provided are an information processing device, etc. that is capable of extracting information specific to a user from speech data. This information processing device is provided with: speech recognition means for generating a character string based on speech data; filtering means for filtering one or more keywords extracted from the character string generated by the speech recognition means, based on one or more words which are relevant to a speaker of the speech data and stored in advance; and output means for outputting a result of the filtering performed by the filtering means.

Information processing device, information processing method and program recording medium

There is provided a screen device that is capable of preventing deformation such as loosening of a horizontally-sliding roll screen due to the weight of the screen. A guide member has a slit that allows a fastener-like member at an upper end of the screen to be slidably engaged therewith in a retained state. In a state in which a space, which allows bending in the vertical direction, is formed above the guide member, both end portions and of the guide member are fixed to an upper horizontal frame of a screen frame, flange portions of the guide member are positioned above protruding walls in the upper horizontal frame, and spring members that apply upward urging forces to the guide member are provided between the protruding walls and the flange portions. Thus, deformation of the screen due to the weight thereof is suppressed by using the guide member.

Roll screen device

A wavelength measuring device configured to detect a wavelength of ultraviolet laser light outputted from a laser resonator with at least one etalon, the wavelength measuring device includes: a first housing having an interior space being sealed and accommodating the etalon, an input window through which the ultraviolet laser light enters to the first housing, the input window being provided at a first opening of the first housing, a first sealing member configured to seal a gap between a rim part of the input window and a circumferential portion of the first opening, a shielding film provided between the rim part of the input window and the first sealing member and configured to shield the first sealing member from the ultraviolet laser light coming from the input window, and a diffusing element provided outside of the first housing and configured to diffuse the ultraviolet laser light before being incident on the input window.

Wavelength measuring device

A line-narrowed KrF excimer laser apparatus includes a laser chamber, a line narrow optical system, an actuator, an output coupling mirror, a wavelength detecting unit, and a wavelength controller. The actuator is capable of changing a wavelength of light selected by the line narrow optical system. The wavelength detecting unit includes a low-pressure mercury lamp accommodating mercury, a getter material that adsorbs at least a part of the mercury, and a hot cathode that excites at least a part of the mercury, an etalon provided at a position where reference light emitted from the low-pressure mercury lamp and detected light emitted from the output coupling mirror are incident on the etalon, and a light intensity distribution sensor configured to detect an intensity distribution profile of interference fringes of the reference light and an intensity distribution profile of interference fringes of the detected light.

Line-narrowed KrF excimer laser apparatus

A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF.

Light beam measurement device, laser apparatus, and light beam separator

An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.

Alignment system and extreme ultraviolet light generation system

An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

Extreme ultraviolet light generation apparatus

A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.

Narrow band laser apparatus

A light source apparatus according to an embodiment may be used for an exposure apparatus which exposes a plurality of wafers by repeating a wafer exposure for exposing a total exposure area of each wafer. The wafer exposure may include a sequential execution of scanning exposures in which each divided area defined by dividing the total exposure area of each wafer is scanned by pulsed light. The apparatus may comprise: a light source controller configured to execute a control for outputting the pulsed light based on a luminescence trigger signal received from the exposure apparatus; a detector configured to detect a characteristic of the pulsed light; and a data collection processor configured to collect at least a piece of data in data included in a pulse light data group related to the pulsed light detected by the detector and a control data group related to the control, and execute a mapping process of mapping the collected data by at least one of scanning exposure basis and wafer exposure basis.

Light source apparatus and data processing method

There may be included: a master oscillator configured to output pulsed laser light; two or more power amplifiers disposed in an optical path of the pulsed laser light to amplify the pulsed laser light; and an optical isolator provided between adjacent two of the power amplifiers in the optical path of the pulsed laser light, and configured to suppress transmission of light traveling from the power amplifiers to a side where the master oscillator is provided.

Laser apparatus and extreme ultraviolet light generation system

Growing community of inventors

Hiratsuka, Japan

Masato Moriya