Mitsui Toatsu Chemicals, Incorporated

Masato Koyama

Nobuhiro Fukuda

Yoshinori Ashida

Kenji Miyachi

A method for preparing an amorphous silicon solar cell is disclosed which comprises forming on a substrate, in the following order, a first electrode, a first conductive film, a thin first substantially intrinsic film, a thicker second substantially intrinsic film, a second conductive film and a second electrode.

Amorphous silicon solar cell and method for manufacturing the same

A method for forming an amorphous semiconductor film, which comprises (a) a film-forming step of forming a semiconductor film having not more than 20 atomic percent of bound hydrogen to a thickness of 3 to 1000 .ANG., and (b) a modifying step of modifying the formed film, the steps being repeated multiple times.

Growing community of inventors

Yokohama, Japan

Masato Koyama