Agency of Industrial Science and Technology

Ebara Corporation

National Institute of Advanced Industrial Science and Technology

Nissan Chemical Industries Limited

Masato Kiuchi

Akiyoshi Chayahara

Naoki Tsuchiya

Yutaka Kimura

Jiro Matsuo

Isao Yamada

Hiroshi Nagasaka

Kanenaga Fujii

Yoshikazu Kimura

Qiang Xu

Shigeharu Tamura

Hiroaki Sakurai

Hiroshi Shioyama

Norimasa Umesaki

Kensuke Murai

[Problem] The main purpose is to provide a novel carbon-containing solid acid which has an excellent catalytic activity and of which the catalytic activity cannot be deteriorated easily even when used repeatedly. [Solution] A carbon-containing solid acid which comprises a carbonaceous material having a sulfonate group, wherein the carbonaceous material has a graphene structure in at least a part thereof and contains boron.

Carbon-containing solid acid having sulfonate group

The present invention is for a transparent conductive film of nitrogen-containing indium tin oxide 5 nm to 100 &mgr;m thick formed on a substrate. The process for producing the transparent film includes exciting the surface of the substrate in a vacuum and depositing vaporized indium tin oxide on the surface of the substrate. The surface may be excited with irradiation with an ion beam. The indium tin oxide may be deposited through vacuum deposition, laser abrasion, ion plating, ion beam deposition, or chemical vapor deposition. Vapor deposition of indium tin oxide may be performed using a sintered product of indium oxide and tin oxide or with indium metal and tin metal.

Transparent conductive film and process for producing the film

The invention provides a method of producing tranparent and conductive ultrathin films of metal carbide or metal nitride on a glass, ceramics or organic polymer substrate, which comprises the steps of exciting a surface of said substrate by irradiating said surface with a carbon or nitrogen ion beam; simultaneously vapor-depositing a transition metal onto said surface to form a carbide or nitride layer; and terminating the excitation and the vapor-deposition when the thickness of the metal carbide or nitride layer is in the range of 1 nm to 50 nm, and the light permeability of the metal carbide or nitride layer is in the range of 30% to 90%, wherein the conductivity of the metal carbide or nitride layer is in the range of 1 k.OMEGA./.quadrature. To 100 k.OMEGA./.quadrature..

Method of forming transparent and conductive ultrathin films

Transparent and conductive ultrathin film and method of producing same

A seal or bearing comprising a combination of a movable member and a stationary member, either one of the movable and stationary members being made of a low thermal expansion coefficient material, and the other being made of a carbon containing material, wherein a sliding surface of the movable or stationary member which is made of the low thermal expansion coefficient material is irradiated with an ion beam consisting essentially of nitrogen ions at the same time as titanium is vacuum-deposited on the sliding surface, thereby forming a thin titanium nitride film on the sliding surface, which provide a seal or bearing which has a reduced coefficient of friction, and which is improved in wear resistance.

Seal or bearing

Growing community of inventors

Osaka, Japan

Masato Kiuchi