Canon Kabushiki Kaisha

Masato Hagiri

Shu Watanabe

Takeshi Nakajima

Mitsuru Seki

Satoshi Tomura

An optical apparatus includes an optical component, a support mechanism configured to support the optical component, a manipulation mechanism configured to manipulate the optical component while contacting the optical component such that a state of the optical component is changed. The optical component is changed by the manipulation mechanism from a first state in which the optical component is supported by the support mechanism to a second state in which the optical component is supported by the manipulation mechanism.

Optical apparatus, exposure apparatus, method of manufacturing optical apparatus, and method of manufacturing article

An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction that is a scan direction, and a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.

Growing community of inventors

Utsunomiya, Japan

Masato Hagiri