Canon Kabushiki Kaisha

Hitachi-high-technologies Corporation

Masatake Akaike

Takayuki Yagi

Takehiko Kawasaki

Norio Kaneko

Hidetoshi Nojiri

Masahiro Fushimi

Koichiro Nakanishi

Fumio Kishi

Takatsugu Wada

Naoyo Gemma

Toshitsugu Morimoto

Hiroshi Matsuda

Keisuke Yamamoto

Tohru Den

Yoshinori Nakayama

Miki Tamura

Futoshi Hirose

Yasushi Koyama

Atsunori Terasaki

Hiroshi Maehara

Kazuaki Ohmi

Taiko Motoi

Haruhito Ono

Takeshi Miyachi

Kenji Tamamori

Rei Kurashima

Satoshi Nozu

Fujio Iwatate

Kiyozumi Niizuma

Jun Akimitsu

Atsuko Shinjou

Atsuko Tanaka

Ken-ichi Nagae

Kozo Hokayama

Ken-Ichi Nagae

Yoshinori c/o Hitachi Ltd Nakayama

The present invention provides an apparatus for discriminating the kind of a sheet material, comprising: a substrate having a recessed portion; a press member situated so that a sheet material can be deflected using the recessed portion; a support member that is deformed as the sheet material situated to cover the recessed portion is pressed by the press member and thereby deflected; and a sensor for detecting the deformation amount of the support member, wherein the kind of the sheet material is discriminated on the basis of detecting the deformation amount of the support member by the sensor.

Apparatus for discriminating sheet material

A signal output apparatus comprises an impact applying unit applying an impact to a sheet from the outside thereof, and a detection unit outputting a signal by the impact. An apparatus for determining the type of sheet comprises an impact applying unit applying an impact to a sheet from the outside thereof, and a detection unit outputting a signal by the impact, wherein the type of the sheet is determined based on the signal from the detection unit. An image forming apparatus comprises an impact applying unit applying an impact to a sheet from the outside thereof, and a detection unit outputting a signal by the impact. A method for determining the type of sheet comprises the steps of applying an impact to a sheet from the outside thereof, outputting a signal from a detection unit by the applying step, and determining the type of sheet based on the signal. An apparatus carries out the method for determining the type of sheet. An information output apparatus used in an image forming apparatus comprises an impact applying unit applying an impact to a target from the outside thereof, and a detection unit outputting information by the impact.

Signal output and image forming apparatus with method of judging sheet type by impact detection

Signal output apparatus, image forming apparatus and information output apparatus

In a method of manufacturing a liquid discharge head, liquid in a pressure generation chamber is pressurized by a piezoelectric driving force of a piezoelectric element, and is discharged from a nozzle communicated with the pressure generation chamber. The method is characterized by the steps of providing a flow passage substrate incorporating the pressure generation chamber, anodically joining a diaphragm to the flow passage substrate, forming electrode layers and a piezoelectric film of the piezoelectric element on the diaphragm, and crystallizing the piezoelectric film during or after the lamination at a crystallization temperature not higher than a strain point of the diaphragm.

Method of manufacturing liquid discharge head

A deflector which makes multilayered wiring possible and prevents contamination during the manufacture includes an electrode substrate () having a plurality of through holes, and an electrode pair made up of first and second electrodes which oppose the side walls of each through hole in order to control the locus of a charged particle beam passing through the through hole, and a wiring substrate () having connection wiring pads connected to the electrode pairs of the electrode substrate to individually apply voltages to the electrode pairs. This deflector is formed by bonding the electrode substrate and wiring substrate via the connection wiring pads of the wiring substrate.

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector

A device is formed by transferring a film onto a substrate when the film requires but the substrate is not adapted to a high temperature heat treatment process. The film having layers and formed on a first substrate having layers is transferred onto a second substrate having layers. The method of transferring the film comprises a first step of forming a lift-off layer and the film to be transferred on the first substrate, a second step of bonding the film to be transferred to the second substrate and a third step of separating the film to be transferred from the first substrate by etching the lift-off layer and transferring it onto the second substrate.

Film transfer method

A microstructure comprising a substrate (1), a patterned structure (beam member) (2) suspended over the substrate (1) with an air-space (4) therebetween and supporting structure (3) for suspending the patterned structure (2) over the substrate (1). The microstructure is prepared by using a sacrificial layer (7) which is removed to form the space between the substrate (1) and the patterned structure (2) adhered to the sacrificial layer. In the case of using resin as the material of the sacrificial layer, the sacrificial layer can be removed without causing sticking, and an electrode can be provided on the patterned structure. The microstructure can have application as electrostatic actuator, etc., depending on choice of shape and composition.

Process for manufacturing microstructure

A method of manufacturing a mask in which laser radiation is projected to a mask substrate of silicon and a supporting frame of heat resisting glass, while a voltage of about 1000-10000 V is applied between the mask substrate and the supporting frame. Cooling water is caused to flow to suppress temperature rise due to the irradiation, to maintain the mask substrate and the supporting frame at a predetermined normal temperature (about the mask temperature in a lithographic pattern transfer process). The light projecting step is performed for a period not shorter than 10 minutes whereby anodic bonding of the mask substrate with the supporting frame is achieved. This prevents a shift of the mask pattern and/or deformation of the mask substrate, and it assures the manufacture of a high precision mask.

Mask structure and method of making the same

A process for anodic bonding, in which Si substrate and glass substrate are contacting each other, a voltage is applied therebetween, and then light is irradiated on a contact portion thereof, whereby the Si substrate and the glass substrate are bonded at a lower temperature than transition temperature of the glass substrate.

Anodic bonding process

Anodic bonding of an insulator containing no movable ion and a conductor through the medium of a conductive film and an insulator layer containing a movable ion affords a bonded member of the insulator containing no movable ion and the conductor without use of any adhesive agent. A method for effecting the anodic bonding is also provided.

Method for bonding an insulator and conductor

An anode bonding method for bonding a first substrate and a second substrate, both of which have a recessed portion, includes the steps of heating the first and second substrates in a stacked state; and bonding the substrates by applying a voltage between the substrates.

Anode bonding method for selected regions

A microstructure comprising a substrate (1), a patterned structure (beam member) (2) suspended over the substrate (1) with an air-space (4) therebetween and supporting structure (3) for suspending the patterned structure (2) over the substrate (1). The microstructure is prepared by using a sacrificial layer (7) which is removed to form the space between the substrate (1) and the patterned structure (2) adhered to the sacrificial layer. In the case of using resin as the material of the sacrificial layer, the sacrificial layer can be removed without causing sticking, and an electrode can be provided on the patterned structure. The microstructure can have application as electrostatic actuator etc., depending on choice of shape and composition.

Microstructure, process for manufacturing thereof and devices

A metal oxide is provided which is represented by the compositional formula :

Substituted superconductive Bi-Sr-Ca-Cu oxide and Bi-Sr-Ca-Ln-Cu oxide

Growing community of inventors

Atsugi, Japan

Masatake Akaike