Asahi Glass Company, Limited

Masataka Eda

Yoko Takebe

Osamu Yokokoji

Atsushi Inoue

A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer, wherein the fluoropolymer has monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1):CF&#x2550;CFCFC(CF)(OR)&#x2014;(CH)CR&#x2550;CHR&#x2003;&#x2003;(1)

Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film

A fluoropolymer (A) having units derived from monomer units formed by cyclopolymerization of at least one fluorinated diene selected from a fluorinated diene represented by the formula (1) and a fluorinated diene represented by the formula (2), and units derived from monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (3):CF&#x2550;CFCF&#x2014;C(CF)(OR)&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(1)CF&#x2550;CFCH&#x2014;CH((CH)C(CF)(OR))&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(2)CF&#x2550;CFCH&#x2014;CH(COOR)&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(3)wherein Rrepresents a hydrogen atom, a blocked group of a hydroxyl group capable of being converted into a hydrogen atom by an acid, or a blocked carboxyl group-containing organic group capable of being converted into a carboxyl group-containing organic group by an acid, Rrepresents a hydrocarbon group having at most 20 carbon atoms, and n represents 0 or 1.

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Yokohama, Japan

Masataka Eda