Kabushiki Kaisha Toshiba

Shibaura Mechatronics Corporation

Masashi Yamage

Takeshi Yamauchi

Osamu Yamazaki

Shigeyuki Takagi

Satoshi Tsuno

Hiroyuki Takada

Katsuaki Aoki

Yutaka Uchida

Ivan Petrov Ganachev

Yuta Sugimoto

Naoki Tajima

Yoshikazu Tsugami

Kohei Shimatani

Kaoru Taki

Noboru Okamoto

A high-frequency antenna of an embodiment is installed on a window of a chamber, and includes first and second antenna elements and first and second relaying portions. The first antenna element extends over a first angle range in a circumferential direction, and the second antenna element extends in the circumferential direction over a second angle range deviating from the first angle range. The second antenna element is arranged away from the window compared to the first antenna element, and is arranged on the outer peripheral side from the first antenna element. The first relaying portion extends toward the side away from the window from the first antenna element, and the second relaying portion extends toward the outer peripheral side, from the first relaying portion to the second antenna element.

High frequency antenna and plasma processing device

According to one embodiment, a shower head includes a head and a magnetic field generator. The head includes a first surface, a second surface opposite to the first surface, an internal compartment, and a plurality of holes. Each of the holes is open to the first surface and to the second surface that faces the compartment, and communicates with the compartment. The magnetic field generator generates a magnetic field inside the holes between the first surface and the second surface.

Shower head, processing apparatus, and shower plate

A plasma generating apparatus includes a coaxial convertor for coaxial-converting a microwave, a generally annular ring slot that passes the coaxial-converted microwave, and a dielectric window that propagates the microwave passed through the ring slot. A plasma is produced by the microwave propagated through the dielectric window. This enables stable formation of a plasma having a uniform distribution over a large area.

Plasma generating apparatus and plasma treatment apparatus

A plasma process end point determination method comprises the steps of measuring a physical quantity in a circuit for producing a plasma within a reaction chamber, and determining a plasma process end point on the basis of an inflection point of the measured physical quantity in relation to the passing of time.

Plasma process end point determination method and apparatus, and plasma evaluation method and apparatus

A plasma processing apparatus according to the present invention includes a microwave guide for introducing a microwave, an air-tight chamber for internally setting an object to be processed, for generating a plasma by introducing the microwave introduced by the microwave guide and by supplying a reaction gas, and for processing the object by an active species generated by the plasma, a dielectric window provided between the microwave guide and the air-tight chamber, for enclosing the air-tight chamber, a top plate provided with a microwave guide port arranged with a gap maintained from the dielectric window, and cooling means provided for the top plate, for cooling heat caused by generation of the plasma, e.g., a cooling means for causing a cooling gas to flow in the gap between the dielectric window and the top plate.

Plasma processing apparatus and a plasma processing method

A microwave excitation plasma processing apparatus comprises a vacuum container having a plasma generating chamber at an upper portion thereof and a processing chamber, a gas supply pipe for supplying a process gas into the plasma generating chamber, a dielectric window arranged in an opening of an upper wall portion of the vacuum container, a rectangular waveguide arranged on the upper wall portion of the vacuum container including the dielectric window and comprising a first wall having a first surface perpendicular to a direction of electric field of a microwave to oppose the dielectric window, second walls having second surfaces parallel to the direction of electric field of the microwave and extending in a direction perpendicular to the first surface, and a third wall having a third surface which is provided on a side opposite to a microwave introducing side perpendicular to the first and second surfaces to reflect the microwave, and a microwave oscillator for introducing the microwave into the waveguide, wherein the waveguide has two slits which are formed in the first wall and located in the vicinity of the second walls, and which extend in parallel or substantially parallel to the second walls, each of the slits having a width which is smaller on a side closer to the third surface.

Growing community of inventors

Yokohama, Japan

Masashi Yamage