Hitachi-high-technologies Corporation

Hitachi-science Systems, Ltd.

Disco Corporation

Ebara Densan Ltd.

Daicel Corporation

Masashi Kimura

Yoshihiko Nakayama

Kenichi Hirane

Daisuke Kobayashi

Takashi Ohshima

Yoshinori Kakinuma

Souichi Katagiri

Masahiro Sasajima

Keigo Kasuya

Yoshihiro Takahoko

Tomoharu Miyashita

Masayuki Kawase

Hitoshi Sakisako

A conveying mechanism includes a suction part that has a suction pad and sucks and holds a target object by the suction pad, a bracket connected to the suction part through a joint that is swingable, an elastic component in which one end part is fixed to the suction part and the other end part is fixed to the bracket, a negative pressure control unit that controls generation of a negative pressure at the suction part, and a movement unit that moves the bracket. The elastic component permits a swing of the suction part according to tilt or deformation of the target object that is sucked and held and, when suction holding of the target object is released, the elastic component returns the orientation of the suction pad to a predetermined orientation when the suction pad is not sucking and holding the target object.

Conveying mechanism

An evacuation structure of a charged particle beam device includes: a vacuum chamber provided with a charged particle source; vacuum piping connected to the vacuum chamber; a main vacuum pump which is connected via the vacuum piping and evacuates the inside of the vacuum chamber; a non-evaporable getter pump disposed at a position between the vacuum chamber and the main vacuum pump in the vacuum piping; and a coarse evacuation port connected at a position between the vacuum chamber and the non-evaporable getter pump in the vacuum piping The coarse evacuation port includes: a coarse evacuation valve that opens and closes the coarse evacuation port; and a leak valve to open the vacuum chamber to the atmosphere.

Charged particle beam device

An electron gun that serves to reduce the quantity of electron stimulated desorption and accomplishes vacuum evacuation efficiently with a sufficient degree of vacuum. An electron sourceand an extraction electrodeare provided for emitting an electron beamfrom the electron source. A first vacuum chambercontaining the electron sourceis connected to a second vacuum chambervia an apertureprovided in the extraction electrode. Each vacuum chamber is differentially evacuated with an independent vacuum evacuation means, and the generation of electron stimulated desorption gasis reduced by securing a wide route of vacuum evacuation around the electron sourceand intercepting the procession of back scattered electronsemitted from the area with the electron beamon the extraction electrodeby using a shielding electrodegiven a prescribed potential.

Charged particle radiation device

Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion. With such an arrangement, it is possible to prevent high-voltage discharge due to an increase in water content of the gap portion and also instability of an electron beam due to a leakage current.

Electron beam apparatus and high-voltage discharge prevention method

Automatic titration analysis apparatus includes a sampling mechanism, a titration mechanism, an analysis mechanism and a control mechanism. The sampling mechanism takes a prescribed quantity of a sample for analysis in accordance with a first signal. The titration mechanism titrates a prescribed quantity of a reagent for analysis of the sample and provides a titer at an end point of the titration according to second signals. The analysis mechanism receives the sample from the sampling mechanism, analyzes the sample and converts a change in the physical properties of the sample caused by the titration into an electrical quantity. The control mechanism provides and applies the first signal to the sampling mechanism, provides and applies the second signals to the titration mechanism, receives the titer from the titration mechanism, receives the electrical quantity from the analysis mechanism, sets the quantity of the sample converted and the titer of the reagent to prescribed values, reads the titer at the end point of the titration, outputs the measured density of the sample calculated therefrom, and controls in sequence the operations of the sampling, titration and analysis mechanisms.

Automatic titration analysis apparatus

Growing community of inventors

Tokyo, Japan

Masashi Kimura