Sony Corporation

Masaru Miyashita

Kenshiro Arase

Akira Tanaka

Hideki Arakawa

A non-volatile memory device including a plurality of block, each including: a main bit line; a plurality of sub-bit lines to which memory transistors are connected and which are arranged in parallel with respect to the main bit line; and two cascade-connected selection gates which are provided between the main bit line and sub-bit lines and which selectively connect the sub-bit lines.

Non-volatile memory device

A semiconductor nonvolatile memory device comprised of bit lines and source lines arranged in a hierarchy of main lines and sub-lines, the main lines and the sub-lines being selectively connected in accordance with the operation of the memory device and memory cells being connected in parallel between the sub-source lines and the sub-bit lines, wherein data is written by introducing electrons from the full channel surface to the charge-storage layer by FN tunneling and is erased by drawing out the electrons in the charge-storing layer from the drain side by FN tunneling. Operation is made possible by a single power source and the area of the cell of the full one transistor memory type is made smaller.

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Kanagawa, Japan

Masaru Miyashita