Shin-etsu Chemical Co., Ltd.

Masaru Konya

Noriaki Hamaya

Toshihiko Tsukatani

Takao Maeda

Hajime Nakano

Hirofumi Kawazoe

Junichi Nakayama

Noboru Yamamoto

A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.

Wafer

A wafer has a rare earth fluoride coating disposed, typically sprayed on a substrate as an outermost layer, the rare earth fluoride being selected from lanthanoid fluorides, yttrium fluoride, and scandium fluoride. It is useful as a dummy wafer in a plasma etching or deposition system.

A coated member comprising a substrate of Mo, Ta, W, Zr or carbon and a coating of rare earth-containing oxide including a surface layer having a Vickers hardness of at least 50; or a coated member comprising a substrate having a coefficient of linear expansion of at least 4&#xd7;10(1/K) and a coating of rare earth-containing oxide thereon is heat resistant and useful as a jig for use in the sintering of powder metallurgical metal, cermet and ceramic materials.

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Tokyo, Japan

Masaru Konya