Mitsubishi Heavy Industries Limited

Mitsubishi Jukogyo Kabushiki Kaisha

Masaru Kodama

Nobuhiko Nishimura

Masaaki Fujita

Toshihiko Imamoto

Kiyotaka Iwatsubo

Satoshi Uchida

Yoshiaki Takeuchi

Masayoshi Murata

Fumitoshi Sakata

Kazutoshi Hamamoto

Ko Takeuchi

Hideshi Tezuka

An ultrasonic detecting apparatus includes a transmitting element for emitting an ultrasonic wave toward a surface to be probed inside a sample from a surface of the sample at a predetermined angle. The ultrasonic detecting apparatus also includes a receiving element for receiving the ultrasonic wave reflected from the surface of the sample. The transmitting element and the receiving element are separated from each other on a single pedestal and are movable on the surface of the sample in a direction perpendicular to the surface to be probed. A distance between the transmitting element and the receiving element is arbitrarily changeable.

Ultrasonic detecting apparatus

A connecting clamp includes a heating member which surrounds a portion to be connected of a steel pipe and heats the portion to be connected, and a first clamp section and second clamp section positioned on opposite sides of the portion to be connected and clamping the steel pipe, whereby the portion to be connected is connected by heating the portion to be connected by the heating member while applying pressure to the portion to be connected by the first and second clamp sections. The first and second clamp sections and the heating member are so arranged as to be slid around the outer surface of the steel pipe from one side of the steel pipe to the other side thereof.

Connecting clamp, connecting apparatus and connecting method

A connecting clamp includes a heating member which surrounds a portion to be connected of a steel pipe and heats the portion to be connected, and a first clamp section and a second clamp section positioned on opposite sides of the portion to be connected and clamping the steel pipe, whereby the portion to be connected is connected by heating the portion to be connected by the heating member while applying pressure to the portion to be connected by the first and second clamp sections. The first and second clamp sections and the heating member are so arranged as to be slidable around the outer surface of the steel pipe from one side of the steel pipe to the other side thereof.

A plasma CVD apparatus whose discharge electrode is a single line member bent in a U shape in an alternating manner and in which a substrate to be processed is held substantially in parallel to the discharge electrode. The electric field around the electrode becomes stronger and the intensity distribution of this field becomes even. As a result, a product film formed on the substrate surface has a uniform thickness, and the film can be formed at high speeds.

Plasma CVD apparatus

A plasma-chemical vapor-phase epitaxy system or a chemical vapor deposition (CVD) system can produce a large thin film of good quality. The CVD system includes a vacuum container having a quartz glass window, a substrate disposed within the vacuum container as opposed to the window, an antenna type discharge electrode disposed outside of the vacuum container as opposed to the window, and a high-frequency power supply for feeding electric power to the same electrode. In this way, by disposing an electrode outside of a container and exciting the reaction gas with high-frequency electromagnetic waves, a large thin film of good quality can be formed.

Growing community of inventors

Nagasaki, Japan

Masaru Kodama