Jx Nippon Mining Metals Corporation

Masaomi Murakami

Junnosuke Sekiguchi

Toru Imori

Akira Noda

Makoto Mikami

Kouji Murakami

The present invention provides a radiation detector UBM electrode structure body and a radiation detector which suppress the degradation of metal electrode layers at the time of formation of UBM layers and achieve sufficient electric characteristics, and a method of manufacturing the same. A radiation detector UBM electrode structure body according to the present invention includes a substrate made of CdTe or CdZnTe, comprising a Pt or Au electrode layer formed on the substrate by electroless plating, an Ni layer formed on the Pt or Au electrode layer by sputtering, and an Au layer formed on the Ni layer by sputtering.

Radiation detector UBM electrode structure body, radiation detector, and method of manufacturing same

A nickel-iron alloy plating solution which can suppress, in a nickel-iron alloy plating solution containing divalent iron ions and divalent nickel ions, oxidation of divalent iron ions to trivalent iron ions and can prevent the occurrence of the precipitation of iron (III) hydroxide to allow stable continuous operation and also to provide a nickel-iron alloy plating solution which allows production of a soft magnetic film which is stable in composition. The nickel-iron alloy plating solution of the present invention is characterized in that it comprises divalent iron ions, divalent nickel ions and a hydroxylamine salt and has a pH of 3.0 or lower.

Nickel-iron alloy plating solution

An aqueous solution containing divalent iron ions having improved storage stability such that the oxidation over time of divalent iron ions in the aqueous solution containing divalent iron ions to trivalent iron ions is suppressed and the occurrence of the precipitation of iron (III) hydroxide is prevented for long periods. The aqueous solution contains divalent iron ions having improved storage stability characterized in that it contains divalent iron ions and a hydroxylamine salt as a reducing agent and has a pH of 3.0 or lower. The pH is preferably 2.2 or lower and more preferably 1.2 or lower.

Aqueous solution containing divalent iron ions

An object of the present invention is to provide a high-purity aqueous copper sulfonate solution and a simplified method of producing this solution. The aqueous copper sulfonate solution of the present invention is characterized in that the copper concentration therein is at least 90 g/L, the content of metal impurities is less than 10 mg/L as metal for each metal impurity, the content of chlorine is less than 10 mg/L, and the sulfonic acid is a sulfonic acid represented by the following general formulaR&#x2014;(SOH)(in the formula, R represents a lower alkyl group, lower alkylidene group, lower alkylene group, or hydroxyalkyl group and n represents 1 or 2).

Growing community of inventors

Kitaibaraki, Japan

Masaomi Murakami