Permelec Electrode Ltd.

Premelec Electrode Ltd.

Wm. Canning Ltd.

Masao Sekimoto

Yoshinori Nishiki

Tsuneto Furuta

Shuhei Wakita

Yukiei Matsumoto

Masaharu Uno

Philippe Rychen

Takanobu Hayashi

Hozumi Tanaka

Kyohei Kuroda

Akio Nishi

Laurent Pupunat

Mitsuo Shibata

Shyuhei Wakita

A method is disclosed, which is capable of subjecting microorganisms to sterilizing or bacteriostatic treatment with good efficiency as compared with the conventional sterilizing or bacteriostatic method using a noble metal electrode. Microorganism-containing water to be treated is electrochemically treated using an anode having conductive diamond to bring the microorganism into contact with the anode, thereby undergoing sterilization. Since the conductive diamond has a high oxidation potential as compared with other electrode substances, direct oxidation reaction due to contact between a microorganism in water to be treated, such asbacteria, and the anode surface occurs strongly as compared with other electrodes, thereby enabling effective sterilization. The conductive diamond has a high ability to generate ozone and has an excellent formation efficiency with respect to the generation of hydrogen peroxide and radicals. Accordingly, an indirect sterilizing effect can also be expected.

Electrochemical sterilizing and bacteriostatic method

An electrolytic cell and method of electrolysis for producing hydrogen peroxide at a moderate current density while preventing metal deposition on the cathode surface. A feed water from which multivalent metal ions have been removed and in which a salt of a univalent metal, e.g., sodium sulfate, has been dissolved in a given concentration is prepared with an apparatus for removing multivalent metal ions and dissolving a salt in low concentration. The feed water is supplied to an electrolytic cell. Even when electrolysis is continued, almost no deposition of a hydroxide or carbonate occurs on the cathode because multivalent metal ions are not present in the electrolytic solution. Due to the dissolved salt, a sufficient current density is secured to prevent an excessive load from being imposed on the electrodes, etc. Thus, stable production of hydrogen peroxide is possible over a long period of time.

Electrolytic cell for hydrogen peroxide production and process for producing hydrogen peroxide

An ice composition obtained by freezing a liquid containing, dissolved therein, hydrogen peroxide produced by electrolysis; and a method of food storage using the composition. Hydrogen peroxide has a lower rate of dissipation into the air and better suitability for long-term storage than ozone. Furthermore, since hydrogen peroxide is electrolytically produced, it eliminates the trouble of transportation, storage, and dissolution. When seawater is used as a feed water for electrolysis, the ice composition thus obtained has a higher cooling effect because it has a melting point lower than 0&deg; C.

Ice composition containing hydrogen peroxide and method of storing perishable food

A chromium plating method using a plating bath comprising trivalent chromium and an electrode which is an anode comprising an electrode substrate of titanium, tantalum, zirconium, niobium or an alloy thereof, coated with an electrode catalyst comprising at least iridium oxide and, optionally, at least one of titanium, tantalum, niobium, zirconium, tin, antimony, ruthenium, platinum, cobalt, molybdenum, tungsten or an oxide thereof. The anode may be placed directly in the chromium plating bath or may be placed in an anode chamber partitioned from the chromium plating bath with an ion-exchange membrane. The chromium plating method may be a barrel plating method.

Electrolytic chromium plating method using trivalent chromium

There are described an anode, a process for producing the same, an apparatus for electrolytic chromium plating, and a method for electrolytic chromium plating, using such anode, wherein the anode comprises an electrically conductive substrate comprising a valve metal or an alloy thereof, a first intermediate layer formed on the sustrate and comprising an oxide of tin, a second intermediate layer formed on the first intermediate layer and comprising either (1) platinum metal and an oxide of tin, or (2) platinum metal, an oxide of tin, and iridium oxide, and a surface layer formed on the second intermediate layer and comprising either (1) platinum metal and an oxide of tin, or (2) platinum metal, an oxide of tin, and iridium oxide, the composition of said surface layer being different form that of said second intermediate layer.

Anode for chromium plating and processes for producing and using the same

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Fujisawa, Japan

Masao Sekimoto