Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Denki K.k.

Masao Kouhashi

Seiichi Handa

Hirofumi Ouchi

Yoshio Kasuga

Tatsunori Hibara

Hiromasa Ishii

Seiichi Watanabe

Kouichi Yamada

Toshihisa Obuse

Hiroshi Kobayashi

Hideki Yabe

Kei Sasaki

Masamitsu Okamura

Kaeko Kitamura

A method for manufacturing a magnetic head core of a complex magnetic head includes binding a first core material of a U-shaped cross section and a second core material of a flat plate shape to form a tubular core material having two bonded portions between the first and second core materials. Then a plurality of grooves are formed in the tubular core material across one of the bonded portions to form a plurality of track surfaces. The grooves are then filled with a fused glass material, and the other of the bonded portions is removed to form a substantially U-shaped core block having a plurality of track surfaces separated by the glass-filled grooves. The U-shaped core block is then sliced along each of the grooves to obtain a plurality of magnetic head cores. A complex magnetic head manufactured by the method is also disclosed.

Complex magnetic head and manufacturing method of complex magnetic head core

Manufacturing method of complex magnetic head core

A complex magnetic head in which magnetically separated upper and lower rank core chips are spaced apart and connected to a support block made of a nonmagnetic material in such a way as to be in parallel with each other. Each of the upper and lower rank core chips have first, second and third cores. Magnetic gaps, whose track widths are different from each other, are provided between the first and second cores of one of the upper and lower rank core chips and between the second and third cores of the other of the upper and lower rank core chips, respectively.

Complex magnetic head having upper and lower rank core chips and method

A film-forming method and an apparatus for a X-ray mask and a film-forming apparatus which are able to diminish stress unevenness in the X-ray mask to zero when a X-ray absorber is formed on a mask substrate by sputtering a target 3 during rotation of the mask substrate. Firstly, a dummy mask substrate is prepared instead of a mask substrate. A dummy X-ray absorber 6 is formed on this dummy X-ray substrate 5 within a sputtering range. Secondly, a stress distribution is measured at every position along a straight line passing through a center of the dummy X-ray absorber 6 and then a desirable stress distribution range X is selected at such a location so as to have a good linear characteristic in a portion of a compressive stress curve which decreases toward an outer periphery of the dummy X-ray absorber 6 in the stress distribution. A center of the desirable stress distribution range X is selected as a rotation center, the mask substrate is placed within the desirable stress distribution range X, and the X-ray absorber is formed by this film-forming technology.

Film-forming method for X-ray mask

Growing community of inventors

Tokyo, Japan

Masao Kouhashi