Mitsubishi Denki Kabushiki Kaisha

Masao Izumo

Nobuyuki Zumoto

Toshinori Yagi

Masaaki Tanaka

Teruo Miyamoto

Yasuhito Myoi

Hajime Nakatani

Atsushi Sugitatsu

Shiro Yamauchi

Tadao Minagawa

Yasushi Minamitani

Shoji Tada

Yoshifumi Matsushita

Yoshie Uchiyama

An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.

Optical processing method and apparatus for carrying out the same

An optical processing apparatus utilizing multiple reflections of a light beam between a mask and a reflector has improved uniformity in the distribution of the light beam over a surface of the mask. In one form, the reflector is disposed in a face-to-face relation with respect to the mask with an angle of inclination relative thereto. In another form, the reflector has a flat or curved taper surface for decreasing an angle of reflection of the light beam at the mask surface at an initial stage, and a flat surface disposed in parallel with the mask surface. In a further form, the reflector is curved in a direction of transmission of the light beam. In a yet further form, an angle of incidence of the light beam is properly adjusted such that a portion of the light beam, which is first reflected from the mask and escapes outwardly from the reflector, is minimized.

Optical processing apparatus

A laser machining apparatus comprises a mask, a reflecting mirror and an imaging optical system. The laser light reflected by the mask and also by the reflecting mirror passes through the mask and images on the work for machining the work. The laser machining apparatus comprises means for causing said mask to move in parallel with said work for machining the work. This laser machining apparatus is able to machine a work having a large surface using small apertured mask. Another type of laser machining apparatus comprises a mask and a platform and an imaging optical system. The mask and the work are puts in the same plane of the platform and driven so that the image of the mask is mapped on the work via the imaging optical system. The laser machining apparatus is able to machine a large area at low price and high accuracy.

Laser machining apparatus

An optical machining apparatus for irradiating light from a light source onto a source to be machined to form a grooves in the surface. The apparatus uses a mask disposed in the path of light from the light source. The mask includes reflective parts for reflecting the light from the light source. The reflective parts are on a first surface of the mask. The mask also includes a reflection member for returning the light reflected at the reflective parts of the mask toward the mask.

Optical machining apparatus

A gas detector for detecting the decomposed SF.sub.6 gas produced by discharge in gas-insulated equipment. The gas detector operates as a cell generating voltage in proportion to the amount of the decomposed SF.sub.6 gas wherein the voltage is generated between the detection electrode including Ag, reacting upon contact by the decomposed gas and the opposing electrode including Ag also, both electrodes sandwiching the ionic conductive solid electrolyte layer including Ag ion therebetween.

Gas detector

Growing community of inventors

Amagasaki, Japan

Masao Izumo