Shin-etsu Chemical Co., Ltd.

Tohoku University

Masao Ando

Hideo Nakagawa

Masaki Takeuchi

Takayuki Kusunoki

Hiroyuki Yamazaki

Nobuhiro Ichiroku

Daiyu Okafuji

Atsushi Wakamiya

Masaru Nakagawa

Shunya Ito

Yuko Matsushige

Provided is a structure for individual authentication in which a pillar pattern region including a plurality of nanopillars formed of synthetic quartz glass is formed on at least a part of a surface portion of a synthetic quartz glass substrate. In the pillar pattern region, the nanopillars have an indentation elastic modulus of 35 to 100 GPa as measured by a nanoindentation method, and the nanopillars are plastically deformed.

Structure for individual authentication, method for producing thereof, and individual authentication method

A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.

Rectangular substrate for imprint lithography and making method

A synthetic quartz glass substrate is machined by bringing a surface of the synthetic quartz glass substrate as the workpiece into contact with and superposing it on a surface of a protective member made of synthetic quartz glass to effect optical contact bonding of the workpiece and the protective member, and passing a cutting tool through the optical contact bonding surfaces. This machining process is able to effectively prevent the generation of microdefects at the cutting tool entry site and extraction site during a cutting operation. Moreover, a fixing agent is not used to join the workpiece and the protective member, and so productivity is high because there is no need for the application and later removal of a fixing agent.

Method for machining synthetic quartz glass substrate

In an imprint mold-forming synthetic quartz glass substrate () of rectangular shape having dimensions Land Lwith L&#x2265;L, a circular region is delineated on the substrate back surface by a circle of radius R with L&#x2212;2R&#x2265;10 mm. When approximation analysis is performed from the 1st to 8th term in the Zernike polynomials on the circular region, a coefficient of the 4th term is equal to or greater than &#x2212;(2R/100,000&#xd7;1) &#x3bc;m.

Imprint mold-forming synthetic quartz glass substrate

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Joetsu, Japan

Masao Ando