Sony Corporation

Sony Semiconductor Solutions Corporation

Sony Group Corporation

Masanori Tsukamoto

Masashi Nakata

Itaru Oshiyama

Tetsuo Gocho

Kaori Tai

Satoru Mayuzumi

Jun Okuno

Rui Morimoto

Yusuke Shuto

Toshiyuki Kobayashi

Kazuhiro Tajima

Semiconductor devices and multiply-accumulate operation devices are disclosed. In one example, a semiconductor device includes synapses in which a nonvolatile variable resistance element taking a first resistance value and a second resistance value lower than the first resistance value and a fixed resistance element having a resistance value higher than the second resistance value are connected in series. An output line outputs a sum of currents flowing through the plurality of synapses.

Semiconductor device and multiply-accumulate operation device

A semiconductor storage device and an electronic device that include a ferroelectric capacitor having a more optimized structure, as a memory cell are provided. A semiconductor storage device includes a field-effect transistor provided in an active region of a semiconductor substrate, a ferroelectric capacitor including a first capacitor electrode and a second capacitor electrode sandwiching a ferroelectric film, the first capacitor electrode being electrically connected to one of a source or a drain of the field-effect transistor, a source line electrically connected to the second capacitor electrode of the ferroelectric capacitor, and a bit line electrically connected to another one of the source or the drain of the field-effect transistor, in which a gate electrode of the field-effect transistor extends in a first direction across the active region, and the source line and the bit line extend in a second direction orthogonal to the first direction.

Semiconductor storage device, manufacturing method of semiconductor storage device, and electronic device

To provide a semiconductor storage apparatus, a product-sum calculation apparatus, and electronic equipment in which memory cells are highly integrated and highly densified. A semiconductor storage apparatus including: a first transistor including a first gate electrode via a ferroelectric film on an activation region including source or drain regions; and a second transistor including source or drain regions in an activation layer provided on the first gate electrode and a second gate electrode on the activation layer via an insulating film.

Semiconductor storage apparatus, product-sum calculation apparatus, and electronic equipment

Provided is a semiconductor storage device and an electronic apparatus having a structure that is more suitable for miniaturization and high integration of memory cells. A semiconductor storage device includes: a recessed portion provided in a semiconductor substrate; a ferroelectric film provided along an inner side of the recessed portion; an electrode provided on the ferroelectric film so as to be embedded in the recessed portion; a first conductivity-type separation region provided in the semiconductor substrate under the recessed portion; and a second conductivity-type electrode region provided in the semiconductor substrate on at least one side of the recessed portion.

Semiconductor storage device and electronic apparatus

Provided are a semiconductor storage element, a semiconductor device, an electronic device, and a manufacturing method of a semiconductor storage element that enable higher-speed operations. The semiconductor storage element includes: a first semiconductor layer of a first conductivity type; a second semiconductor layer of a second conductivity type that is provided below the first semiconductor layer; a gate electrode provided on the first semiconductor layer; a gate insulator film provided between the first semiconductor layer and the gate electrode; a drain region of the second conductivity type that is provided in the first semiconductor layer on one side of the gate electrode; a source region of the second conductivity type that is provided in the first semiconductor layer on another side facing the one side across the gate electrode; and a bit line configured to electrically connect with both of the source region and the first semiconductor layer.

Multi-layer semiconductor element, semiconductor device, and electronic device for storage, and method of manufacturing the same

To provide a semiconductor memory device that avoids a voltage drop caused by an oxide film formed on a surface of a semiconductor substrate, and appropriately operates even in a case where a memory cell array is formed. A semiconductor memory device including a first transistor, a capacitor provided with a pair of capacitor electrodes opposed to each other via an insulator, one of the capacitor electrodes being electrically coupled to a gate electrode of the first transistor, a second transistor in which one of a source or a drain is electrically coupled to one of a source or a drain of the first transistor and to another of the capacitor electrodes, and a plate line electrically coupled to the gate electrode of the first transistor and to the one of the capacitor electrodes.

Semiconductor memory device, electronic apparatus, and method of reading data

Provided is a semiconductor storage element including a first transistor having a gate insulation film that includes a ferroelectric material at least partially and being a transistor to which information is written, and a second transistor that is coupled to, at one of a source and a drain, a source or drain of the first transistor. The first transistor has a threshold voltage smaller than 0 V when writing information and a threshold voltage smaller than 0 V when erasing information.

Semiconductor storage element, semiconductor storage device, semiconductor system, and control method

A Provided is a semiconductor storage element that includes a memory cell transistor including a gate insulator film at least partially including ferroelectric material, and a selection transistor provided in such a manner that one of a source or a drain is connected with a gate electrode of the memory cell transistor via a connection layer, and a gate insulator film faces the gate insulator film of the memory cell transistor in a layer stack direction across the connection layer.

Semiconductor storage element, semiconductor storage device, and semiconductor system

A semiconductor storage element includes a first transistor including a gate insulator film at least partially formed by a ferroelectric material, a second transistor connecting with a gate of the first transistor at one of a source or a drain, and a third transistor connecting with a drain of the first transistor at one of a source or a drain. The semiconductor storage element is arranged in a matrix, and each of the second and third transistors connects with a word line at a gate and connects with a bit line at another one of the source or the drain.

Semiconductor storage element and electronic device

Exemplary embodiments of the present invention are directed towards a method for fabricating a self-aligned contact under a bitline in a damascene structure for a memory device comprising forming a dummy pattern, forming dielectric sidewalls using a first dielectric film around the dummy pattern, forming a second dielectric film around the dielectric sidewalls, removing the dummy pattern forming a plurality of trenches, depositing active cell material in each of the plurality of trenches, forming a third dielectric film atop the active cell material; and creating a self-aligned contact hole using etch selectivity between the dielectric sidewalls and the second dielectric film.

Method for forming a self-aligned contact in a damascene structure used to form a memory device

A manufacturing method of a semiconductor device includes: forming a first gate insulating film on a semiconductor substrate in first and second regions in an active area; forming first gate electrodes on the first gate insulating film in the first and second regions; forming source/drain regions by introducing impurities at both sides of the first gate electrode in the first and second regions; performing heat treatment of activating the impurities; forming a stress liner film so as to cover the whole surface of first gate electrodes in the first and second regions; removing the stress liner film at an upper portion of the first gate electrode in the second region while allowing the stress liner film at least at a portion in the first region to remain to expose the upper portion of the first gate electrode in the second region; forming a groove by removing the first gate electrode in the second region; and forming a second gate electrode in the groove.

Manufacturing method of semiconductor device and semiconductor device

A semiconductor memory system and method of manufacture thereof including: a base wafer; an isolation region on the base wafer; an ion implanted region on the base wafer separated by the isolation region; a bit line contact plug over the ion implanted region; an isolation sidewall on the sides of the bit line contact plug; a resistor or capacitor on the isolation sidewall opposite the bit line contact plug between the bit line contact plug and another of the bit line contact plug; and a bit line over the resistor or capacitor and on the bit line contact plug.

Semiconductor memory system with bit line and method of manufacture thereof

A semiconductor device including an N-channel insulated gate field effect transistor and a P-channel insulated gate field effect transistor, the device having: a first insulating layer and a second insulating layer; and gate electrode contact plugs. Each of the gate electrodes of the N-channel insulated gate field effect transistor and the P-channel insulated gate field effect transistor is buried in a gate electrode formation opening provided in the first insulating layer.

Semiconductor device and method for manufacturing same

Disclosed herein is a semiconductor device including an N-channel insulated gate field effect transistor and a P-channel insulated gate field effect transistor, the device having: a first insulating layer and a second insulating layer; and gate electrode contact plugs. Each of the gate electrodes of the N-channel insulated gate field effect transistor and the P-channel insulated gate field effect transistor is buried in a gate electrode formation opening provided in the first insulating layer.

In PMOS having a gate electrode of a p-type polysilicon film along with a silicon nitride film boron diffusion from the p-type polysilicon film and boron punching through the gate oxide film are prevented, thereby stabilizing the properties of the PMOS. Hydrogen existing in the silicon nitride film accelerates boron diffusion from the film To prevent it, all subsequent steps after the step of forming the silicon nitride film are effected within a temperature range within which the boron diffusion is not accelerated by hydrogen. Forming the silicon oxide film through reduced pressure CVD is effected in a furnace at a temperature lower than 850&deg; C. Annealing for dopant activation in the compensation region to be formed on the substrate in the bottom of the contact hole is effected in a manner of RTA (rapid thermal annealing) at a temperature lower than 1000&deg; C.

Growing community of inventors

Kanagawa, Japan

Masanori Tsukamoto