Sumitomo Chemical Company, Limited

Sony Corporation

Masanori Shinada

Naoki Takeyama

Masumi Suetsugu

Takehiro Kusumoto

Taichi Natori

Hiroki Endo

Kazuhiro Machiguchi

Yuuji Ueda

A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I)wherein, A representssulfide group, disulfide group orbivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group,sulfide group, or disulfide group,X represents nitrogen atom or C(NH), and Rand Rindependently represent hydrogen or alkyl.

Negative type resist composition

A positive type colored photosensitive resin composition containing an alkali-soluble copolymer resin which comprises repeating units derived from styrene and repeating units derived from hydroxystyrene, a ratio (molar ratio) of the latter repeating units to the former repeating units is from 1:0.7 to 1:20 and has a polystyrene-converted weight average molecular weight of 6,000 to 15,000.

Colored photosensitive resin composition and color filter comprising the same

A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability: is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I)

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Osaka, Japan

Masanori Shinada