Other

Fuji Electric Co., Ltd.

Sumitomo Metal Industries, Inc.

Institute for Laser Technology

Masanori Akatsuka

Yasuo Koike

Yoshiyuki Yonezawa

Yasukazu Izawa

Sadao Nakai

Masanobu Yamanaka

Chiyoe Yamanaka

Kouji Sueoka

Masato Ohmi

Method of manufacturing silicon epitaxial wafer

A sample is placed between a circular polarizer and an analyzer in an optical path between a monochromatic light source and a two-dimensional optical receiver. Parallel beams emitted from the monochromatic light source are converted into circularly polarized light by the circular polarizer. After transmitting the sample, the light is guided to the analyzer. While rotating the analyzer about the axis of the beams, image data are detected by optical receiver at a step of a regular rotation angle, and the detected image data are sampled to be sent to an image processing device in the next stage. On the basis of the image data, an operation is conducted on each pixel to obtain a relative phase difference due to birefringence of the sample, the two-dimensional birefringence distribution including the sign of the relative phase difference, and also the principal axis direction.

Birefringence distribution measuring method

Growing community of inventors

Osaka, Japan

Masanori Akatsuka