Mitsubishi Electric Corporation

Masanao Ito

Kohei Ebihara

Masayuki Furuhashi

A semiconductor device includes a semiconductor layer including a super junction layer in which an n-type pillar layer and a p-type pillar layer are alternately disposed and a p-type withstand voltage holding structure formed on an upper layer part of the semiconductor layer to surround an active region. At least one withstand voltage holding structure overlaps with the super junction layer in a plan view. At least one withstand voltage holding structure overlapping with the super junction layer in a plan view has a gap which is an intermittent part of the withstand voltage holding structure.

Semiconductor device, power conversion device and method of manufacturing semiconductor device

A semiconductor device of the present invention includes a semiconductor region having a first main surface, wherein the semiconductor region includes: alternating n-type pillar layers and p-type pillar layers along the first main surface; a p-type first well layer located within each of the n-type pillar layers at a top surface of the n-type pillar layer; an n-type first source layer located within the first well layer at a top surface of the first well layer; a first side surface dielectric layer located on a side surface in a first trench located at each of boundaries between the n-type pillar layers and the p-type pillar layers, and being in contact with the first well layer and the first source layer; a first bottom surface dielectric layer located on a bottom surface in the first trench, and being at least partially in contact with one of the p-type pillar layers.

Semiconductor device having trench gate electrodes formed in first pillars including source layers formed in the first pillars being deeper into the substrate than first source layers in second pillars

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Tokyo, Japan

Masanao Ito