Daicel Chemical Industries, Ltd.

Daicel Corporation

Tokyo Ohka Kogyo Co., Ltd.

Masamichi Nishimura

Kiyoharu Tsutsumi

Keizo Inoue

Takahiro Iwahama

Hiroshi Koyama

Akira Eguchi

Tomoyuki Hirano

Yoshiyuki Utsumi

Yoshitaka Komuro

Mitsuru Ohno

Naoki Yamashita

Disclosed is a monomer containing an N-acylcarbamoyl group and a lactone skeleton. The monomer is exemplified by Formula (1): where Ris selected typically from hydrogen and C-Calkyl; Ris, independently in each occurrence, selected typically from halogen and optionally halogenated C-Calkyl; 'A' is selected from C-Calkylene, oxygen, sulfur, and non-bond; m represents an integer of 0 to 8; X represents, independently in each occurrence, specific N-acylcarbamoyl; n represents an integer of 1 to 9; and Y represents a C-Cdivalent organic group.

Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound

Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects. The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from &#x2014;O&#x2014;, &#x2014;C(&#x2550;O)&#x2014;, &#x2014;C(&#x2550;O)&#x2014;O&#x2014;, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;O&#x2014;, &#x2014;C(&#x2550;O)&#x2014;O&#x2014;C(&#x2550;O)&#x2014;, &#x2014;C(&#x2550;O)&#x2014;NH&#x2014;, &#x2014;S(&#x2550;O)&#x2014;O&#x2014;, &#x2014;S(&#x2550;O)&#x2014;O&#x2014;, &#x2014;OR, &#x2014;C(&#x2550;O)&#x2014;OR, and &#x2014;CN, where Rrepresents, independently in each occurrence, optionally substituted alkyl. 

Polymer compound, resin composition for photoresists, and method for producing semiconductor

Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30&#xb0; C. to 90&#xb0; C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 &#x3bc;m or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.

Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method

A polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Rrepresents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; Rs each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; 'm' is the number of Rs; 'n' is the number of cyano groups; and CH&#x2550;C(R)COO&#x2014; group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Polycyclic ester containing cyano group and lactone skeleton

Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Rrepresents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; Rs each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; 'm' is the number of Rs; 'n' is the number of cyano groups; and CH&#x2550;C(R)COO&#x2014; group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

A polymeric compound for photoresist of the present invention includes a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton in the structure. The monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton includes a monomer unit represented by the following Formula (I):wherein R is a hydrogen atom or a methyl group. The polymeric compound for photoresist may include a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton, a monomer unit having a group of adhesion to substrate, and a monomer unit having an acid-eliminating group. The polymeric compound for photoresist of the present invention exhibits not only adhesion to substrate, acid-eliminating property and resistance to dry-etching but also has well-balanced solubility in solvents for photoresist and alkali-soluble property.

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Himeji, Japan

Masamichi Nishimura