Canon Kabushiki Kaisha

Masami Tsukamoto

Tatsuya Suzuki

Shinichi Hara

Akira Miyake

Hiroshi Maehara

Keiko Chiba

Yutaka Watanabe

Makoto Kubota

Takanori Matsuda

Toshihiro Ifuku

Jumpei Hayashi

Mitsuaki Amemiya

Mikio Shimada

Masaya Kobayashi

Kenji Suzuki

Akio Kashiwazaki

Toru Nagata

Yoshinori Kotani

Shigeru Terashima

Yoshihiro Ohashi

Tamaki Kobayashi

Yasuaki Fukuda

Yuji Chiba

Noboru Kunimine

Tomoyuki Oike

Masayuki Tanabe

Satoshi Yamabi

Taiji Tomita

A scintillator panel is provided. The scintillator panel comprises: a support; a scintillator configured to generate light in accordance with incident radiation; a light reflecting layer arranged between the support and the scintillator and configured to reflect the light; a semi-transmissive layer arranged between the light reflecting layer and the scintillator and configured to reflect part of the light and transmit other part of the light; and an optical adjustment layer arranged between the light reflecting layer and the semi-transmissive layer and configured to make an optical distance between the light reflecting layer and the semi-transmissive layer become a length with which the light resonates.

Scintillator panel and radiation imaging apparatus

A photoelectric conversion device, including: a photoelectric conversion substrate having a plurality of photoelectric conversion portions and a microlens array arranged on the plurality of photoelectric conversion portions; a light-transmitting plate covering the microlens array; and a film arranged between the microlens array and the light-transmitting plate, wherein the film has a refractive index within a range from 1.05 to 1.15, an average transmittance of light in a wavelength region within a range from 400 nm to 700 nm of 98.5% or higher, and a film thickness within a range from 500 nm to 5000 nm.

Photoelectric conversion device, and equipment

Provided are a barium titanate-based piezoelectric ceramics having satisfactory piezoelectric performance and a satisfactory mechanical quality factor (Q), and a piezoelectric element using the same. Specifically provided are a piezoelectric ceramics, including: crystal particles; and a grain boundary between the crystal particles, in which the crystal particles each include barium titanate having a perovskite-type structure and manganese at 0.04% by mass or more and 0.20% by mass or less in terms of a metal with respect to the barium titanate, and the grain boundary includes at least one compound selected from the group consisting of BaTiOand BaTiO, and a piezoelectric element using the same.

Manufacturing method for piezoelectric ceramics

Piezoelectric ceramics, manufacturing method therefor, piezoelectric element, liquid discharge head, ultrasonic motor, and dust removal device

A laminate film for protecting a printed image formed on a recording medium by an ink-jet recording system, comprising a surface layer, an intermediate layer and a penetrative layer formed on a heat-resistant substrate in that order. The surface layer and the intermediate layer have a thermally softening property, the intermediate layer has a glass transition temperature lower than that of the surface layer, and the penetrative layer has a thermally melting property.

Laminate film and composite structure with imaged recording medium

An illumination optical system illuminates a surface to be illuminated. The illumination optical system includes a mirror having a surface effective to shape X-rays from a source into X-rays having an arcuate sectional shape, and an optical system for illuminating the surface to be illuminated, with the X-rays having an arcuate sectional shape from the mirror and in an oblique direction with respect to that surface.

X-ray illumination optical system and X-ray reduction exposure apparatus

A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.

Reflection type mask

An exposure apparatus for illuminating a pattern with light from a light source and for exposing a predetermined surface with light from the pattern includes (i) a projection optical system for projecting the pattern onto the predetermined surface, the projection optical system having at least one optical element having optical surfaces, and (ii) a gas supplying device for locally supplying a gas to the at least one optical element. In one aspect, the gas supplying device directly blows the gas toward one of the optical surfaces of the at least one optical element, which is closest to the predetermined surface, from the predetermined surface side.

Contamination prevention in optical system

An exposure apparatus includes a chuck for holding an object and an optical system for directing light from a light source to the object held by the chuck. The optical system includes a multilayer film mirror which has a concave reflecting surface, wherein an area of contacting portions of the chuck is set so that the contact portions area of the chuck is at most 10% of an area of the object held by the chuck.

X-ray projection exposure apparatus and a device manufacturing method

An X-ray illumination optical system for an X-ray reduction projection exposure apparatus includes an oblique projection reflection integrator having a reflection surface provided by a plurality of small cylindrical surfaces arrayed in parallel, to perform Koehler illumination of a region of arcuate shape. It enables X-ray illumination of only an arcuate region and reduces loss of light quantity and exposure time.

Disclosed is an exposure apparatus which includes an optical element, a gas supplying unit for supplying a predetermined gas around the optical element, and an organic compound decomposition mechanism for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element without a necessity of using many filters in combination.

Exposure apparatus, and device manufacturing method

The present invention provides a laminating film which has a thin base material processable with a low energy and a protection layer capable of giving a high optical density and a high glossiness to a printed image by lamination, and to provide a process for lamination with the laminating film. The laminating film of the present invention comprises a base material, and an image protection layer formed on the base material and having at least an adhesion layer capable of adhering to an image surface, wherein the base material has a thickness ranging from 1.5 to 6.0 &mgr;m and has an arithmetic average roughness (Ra) of not more than 50 nm and a ten point height of roughness profile (Rz) ranging from 1200 nm to 2000 nm according to JIS B0601.

Laminating film and lamination process using the same

An exposure method for transferring a pattern of a mask onto a member to be exposed. The method includes the steps of making preparations for exposure while a protection cover is attached to the mask, executing alignment between the member to be exposed and the mask while the protection cover is detached from the mask, and executing exposure with X-rays while the protection cover is detached from the mask.

X-ray mask, and exposure method and apparatus using the same

A reflection-type mask for use in exposing a pattern onto a photosensitive material, wherein the mask includes a reflection area, having a multilayer film, for reflecting exposure light, and a non-reflection area which does not reflect the exposure light, the reflection area and the non-reflection area forming a mask pattern, wherein at least one layer of the multilayer film consists of an impurity semiconducter, whereby bad influences, for example, caused by poor conduction of the multilayer film at mask-production stage, can be prevented.

Reflection-type mask for use in pattern exposure, manufacturing method therefor, exposure apparatus, and method of manufacturing a device

An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

Growing community of inventors

Yokohama, Japan

Masami Tsukamoto