International Business Machines Corporation

Masami Shinohara

Mitsuru Uda

Evan G Colgan

Tsuyoshi Yamaguchi

Shunsuke Tanaka

Mamoru Nishida

Kohichi Ishimoto

A slurry collection deviceincludes a ring-shaped barrier memberprovided around a turntable T of a polishing machine E and a ring-shaped slurry collection containerprovided around the barrier memberThe turntable T is connected to an upper end of a main rotation shaft Tthat sticks out from a bottom portion of a sink S of the polishing machine E and is lifted from the bottom portion of the sink S. The slurry collection deviceof the present invention is inserted between the turntable T and the sink S.

Slurry collection device and method

Incident light from the space between the light-reflecting films in a liquid crystal light valve of a liquid crystal display device, especially in a reflection-type liquid crystal light valve of a projection-type liquid crystal display device is effectively blocked. The liquid crystal light valve having a semiconductor substrate, a counter substrate, light-reflecting films, and liquid crystal comprises a light-blocking layer and light shields formed between the light-blocking layer and the light-reflecting films.

Liquid crystal light valve and method for producing same, and liquid crystal projection display device

To provide a film thickness testing apparatus and a film thickness testing method in which coherence between light reflected from the surface of a film and light reflected from the surface of a substrate is improved so as to accurately visually test film thickness irregularities. Film thickness testing is conducted by using a light source part for irradiating a substrate with light having an intensity peak with a half band width of 30 nm or less and having spectral intensity in a peak wavelength region alone.

Film thickness testing apparatus and method

An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon. Thus, a reflection type liquid crystal device is provided having a planarized light reflective face for a reduced reflection loss, along with a method for manufacturing the same, and a projection display system using such a reflection type liquid crystal device.

Reflection type liquid crystal device, manufacturing method therefor, and projection display system

The inspecting apparatus according to the present invention includes an illuminator for emitting radiation onto a substrate having a surface on which a fine feature pattern is formed. Inspection for defects in the pattern is performed by visually inspecting radiation diffracted by the surface. The illuminator provides radiation including two different complementary colors.

Illuminator for macro inspection, macro inspecting apparatus and macro inspecting method

This invention relates to a reflection liquid crystal display device using a reflection liquid crystal light bulb and a method for fabricating such liquid crystal display devices, and an object thereof is to provide a liquid crystal display device and its manufacture wherein the numerical aperture of the subpixel is increased to improve the display brightness. The present method comprises the steps of forming an optical absorbing layer 26 on a semiconductor substrate 1; forming a plurality of light reflecting films 32 on the optical absorbing layer 26 via an insulating film 28; forming an insulating film 36 all over the surface; coating positive photoresist all over the insulating film 36 to form a resist layer 64; exposing and developing the resist layer 64 from above to form a mask in such a way that the resist layer 64 remains only on the regions between the plurality of light reflecting films 32 in a self-aligned manner; and using the mask to etch the insulating film 36 to form pillar-shape spacers 34 on the regions between the plurality of light reflecting films 32.

Growing community of inventors

Shiga-ken, Japan

Masami Shinohara