Hitachi-high-technologies Corporation

Hitachi Construction Machinery Co., Ltd.

Masami Kamibayashi

Naoyuki Kofuji

Ken'etsu Yokogawa

Nobuyuki Negishi

Masatoshi Miyake

Hiroyuki Adachi

Hiroshi Watanabe

Isao Karube

Kunitsugu Tomita

Eiji Egawa

Seiya Kato

Ryota Niizeki

Tsuyoshi Fujita

Hidehiro Iizuka

A site management system is provided with a server that acquires information about a construction machine and a construction machine operator at a construction site through a communication channel, and manages work conditions at the construction site. The server includes an information registration unit that acquires and registers position information, acceleration data, and gyro data of the construction machine and the construction machine operator, and a riding determination unit that determines a proximity state between the construction machine and the construction machine operator from the position information of the construction machine and the construction machine operator, and determines whether or not the construction machine operator is riding the construction machine from the acceleration data and gyro data of the construction machine operator in addition to the proximity state.

Site management system

A server device for generating and outputting work management information of at least one carrier. The server device comprises a storage device for storing a program for generating work management information, and a controller for reading the program from the storage device and generating work management information by executing the program. The controller performs: a process of acquiring position information about at least one carrier; a process of generating, based on the position information, work type information indicating whether the carrier is performing a predetermined work or moving; a process of calculating a required time for each work type information item of the carrier; a process of comparing the required time for each work type information item and extracting a work element with low work efficiency based on a first rule concerning required time; and a process of outputting the extracted work element with low work efficiency.

Work management system

In the plasma etching method, a sample is placed on a stage in a chamber. A first gas is introduced into the chamber. Electric field is supplied within the chamber to plasma is generated from the first gas. A first RF power of a first frequency, which is for generating a bias voltage in the sample for etching the sample with radicals which are generated in the plasma while the plasma is generated, is supplied to the stage. A second gas is introduced from a position in outer periphery of a surface of the stage, on which the sample is placed. A second RF power of a second frequency higher than the first frequency and capable of generating plasma from the second gas above the stage that allows radicals generated in the plasma generated from the second gas to be supplied in the outer periphery, is supplied to the stage.

Plasma etching method

Growing community of inventors

Tokyo, Japan

Masami Kamibayashi