Sumitomo Chemical Company, Limited

Masako Sugihara

Koji Ichikawa

Hiromu Sakamoto

Takashi Nishimura

Tatsuro Masuyama

Junji Nakanishi

Mitsuyoshi Ochiai

Yuko Yamashita

Maki Kawamura

Isao Yoshida

Takashi Hiraoka

Masahiko Shimada

Mutsuko Higo

Maiko Goda

A resist composition includes a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: wherein, in formula (3), Rrepresents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.

Resist composition and method for producing resist pattern

A photoresist composition comprising: a resin which has a structural unit represented by formula (I): wherein Rrepresents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and Rrepresents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin; an acid generator; and a solvent.

Photoresist composition

The present invention provides a resist composition which has sufficient resistant to a plating treatment and is capable of forming a resist pattern with high accuracy. The present invention also provides a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern. The present invention relates to a resist composition comprising a compound (I) having a quinone diazide sulfonyl group, a resin comprising a structural unit having an acid-labile group (A1), an alkali-soluble resin (A2) and an acid generator (B); a method for producing a resist pattern using the resist composition; and a method for producing a plated molded article using the resist pattern.

Resist composition and method for producing resist pattern, and method for producing plated molded article

A resist composition contains: a resin having a structural unit represented by formula (I), an alkali-soluble resin, an acid generator, and a solvent: wherein Rrepresents a hydrogen atom or a methyl group, Rand Reach independently represent a hydrogen atom or a Cto Chydrocarbon group, Rrepresents a Cto Calicyclic hydrocarbon group, Rrepresents a Cto Calkyl group or a Cto Calkoxy group, and 'p' represents an integer of 0 to 4.

A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a Cto Chydrocarbon group that may be substituted with a hydroxy group, a Cto Cacyl group or a hydrogen atom, Rin each occurrence independently represents a Cto Calkyl group or a Cto Calkoxy group, 'p' represents an integer of 0 to 4, Z represents a divalent Cto Chydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group, *&#x2014;[(CH)&#x2014;O]&#x2014; (Ia): wherein 'w' and &#x201c;r&#x201d; each independently represents an integer of 1 to 10, and * represent a bonding position.

Resin, resist composition and method for producing resist pattern

A resist composition contains: a resin having an acid-labile group, an acid generator, a compound having two or more phenolic-hydroxy groups and being other than a resin, and a solvent. The resist composition of the disclosure can provide a resist pattern showing excellent shape and detachability, therefore, the present resist composition can be used for semiconductor microfabrication with resist patterns showing excellent shape.

A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1):  

A salt represented by the formula (X): wherein Qand Qeach independently represent a fluorine atom etc., Land Lindependently each represent a C1-C17 divalent saturated hydrocarbon group, ring Wrepresents a C3-C36 saturated hydrocarbon ring, Ris independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Zrepresents an organic counter ion, and Wrepresents a group represented by the formula (X-1): wherein ring Wrepresents a C4-C36 saturated hydrocarbon ring in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, with the proviso that at least one &#x2014;CH&#x2014; in the C4-C36 saturated hydrocarbon ring is replaced by &#x2014;CO&#x2014;, Ris independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring Wrepresents a C3-C36 saturated hydrocarbon ring, Ris independently in each occurrence a hydroxyl group etc., Ris independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

Salt and photoresist composition containing the same

A salt having a group represented by the formula (I):-T&#x2003;&#x2003;(I)wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by &#x2014;O&#x2014; or &#x2014;S&#x2014; and which can have one or more substituents.

A photoresist composition comprising: wherein the ring Wis a nitrogen-containing heterocyclic ring, or a benzene ring having a substituted or unsubstituted amino group,

A salt represented by the formula (X): wherein Qand Qeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lrepresents a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, ring Wrepresents a C4-C36 lactone ring, Ris a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Zrepresents an organic counter ion, and Wrepresents a group represented by the formula (X-1): wherein Lrepresents a single bond etc., ring Wrepresents a C3-C36 saturated hydrocarbon ring in which one &#x2014;CH&#x2014; is replaced by &#x2014;CO&#x2014; and in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, Rrepresents a C1-C12 hydrocarbon group, Ris a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein Lrepresents a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, ring Wrepresents a C3-C36 saturated hydrocarbon ring, Ris a hydroxyl group etc., Ris a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

A salt represented by the formula (I-Pa): wherein Xrepresents a single bond or a C1-C4 alkylene group,

A salt represented by the formula (I&#x2014;Pb): 

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Nishinomiya, Japan

Masako Sugihara