Mitsubishi Denki Kabushiki Kaisha

Masako Shimizu

Ken-Ichi Tanaka

A pattern recognition apparatus and method in which a set is produced which includes a fundamental pattern vector on a basis place and other fundamental pattern vectors of the patterns displaced from the fundamental pattern on the basis place. Then a subspace spanned by fundamental pattern vectors included in the set is generated. A test pattern vector of a wafer to be inspected is projected to the subspace and similarity between the fundamental vectors and the test pattern vector is measured. Further, an image is used after it is filtered by a normalization filter. Furthermore, sensitivity of pattern recognition is varied by changing the dimension of the pattern vectors. Moreover, for objects expressed by numerical values which can not be compared directly, the data of the objects are transformed into images and, then, a set of fundamental pattern vectors are worked out.

Method and apparatus of pattern recognition

Disclosed is a moving object recognizing system, resistant to noise, which precisely obtains velocities, positions and configurations of an object moving in three-dimensional space. The system employs a bidirectional neural network including velocity neurons, coupled by twos and disposed, for respectively obtaining x-and-y components of an optical flow at respective points of the moving object and also line processes, interposed between the velocity neurons, for taking analog values for detecting edges of the moving object.

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Hyogo, Japan

Masako Shimizu