Shin-etsu Chemical Co., Ltd.

Shin-etsu Chemical C O., Ltd.

Tohoku University

Masaki Takeuchi

Daijitsu Harada

Hiroyuki Yamazaki

Harunobu Matsui

Daiyu Okafuji

Atsushi Watabe

Shuhei Ueda

Yukio Shibano

Tohru Kubota

Yoko Ishitsuka

Masao Ando

Hisashi Yagi

Ayumu Kiyomori

Mikio Endo

Takayuki Honma

Kazuo Shirota

Mamoru Morikawa

Akira Yamamoto

Ryouhei Hasegawa

Naoki Yarita

Toshinobu Ishihara

Yasufumi Kubota

Tetsushi Tsukamoto

Masaru Nakagawa

Kazuhiko Aoki

Junichiro Nishida

Shunya Ito

Kento Tsukada

Provided is a substrate for transferring microstructures such as a micro LED including an engraved mark. The substrate for transferring microstructures is less likely to cause a recognizing error of the engraved mark to occur in a reading device, and makes it possible to stably and continuously read the engraved mark. A substrate for transferring microstructures includes a synthetic quartz glass substrate and a silicone pressure-sensitive adhesive agent layer provided on a front surface of the synthetic quartz glass substrate. The substrate includes an engraved mark provided in the from surface.

Substrate for transferring microstructures and method for manufacturing the same

A synthetic quartz glass substrate with an antireflection film, including: a synthetic quartz glass substrate; and an antireflection film formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the main surface of the synthetic quartz glass substrate is within 5 degrees, and the antireflection film includes a first layer containing AlO, a second layer containing HfO, and a third layer containing MgFor SiOsequentially laminated on the main surface of the synthetic quartz glass substrate.

Synthetic quartz glass substrate with antireflection film, window material, lid for optical element package, optical element package, and light irradiation device

A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nmor less at a spatial frequency of 0.1 μmor more and 20 μmor less, the maximum value being obtained by measuring a surface morphology of a region of 10 μm×10 μm with an atomic force microscope.

Mask blank glass substrate

An imprint mold-forming substrate is manufactured by providing a starting imprint mold-forming substrate () having a patterned portion () and a non-patterned portion (), providing a table () having a recess (), bonding the substrate () to the table () such that the patterned portion () is received in the recess () of the table to define a space region () between the patterned portion () and the table () such that the patterned portion is not in direct contact with the table, and performing contour machining on the substrate () secured to the table ().

Manufacturing of imprint mold-forming substrate

Provided is a structure for individual authentication in which a pillar pattern region including a plurality of nanopillars formed of synthetic quartz glass is formed on at least a part of a surface portion of a synthetic quartz glass substrate. In the pillar pattern region, the nanopillars have an indentation elastic modulus of 35 to 100 GPa as measured by a nanoindentation method, and the nanopillars are plastically deformed.

Structure for individual authentication, method for producing thereof, and individual authentication method

A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.

Rectangular substrate for imprint lithography and making method

A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250° C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450° C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400° C. for 5-10 hours.

Synthetic quartz glass substrate and making method

A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nmor less at a spatial frequency of 0.1 &#x3bc;mor more and 20 &#x3bc;mor less, the maximum value being obtained by measuring a surface morphology of a region of 10 &#x3bc;m&#xd7;10 &#x3bc;m with an atomic force microscope.

A synthetic quartz glass cavity member () is bonded to a substrate () having an optical device () mounted thereon such that the device may be accommodated in the cavity member. The cavity member () has an inside surface consisting of a top surface () opposed to the device () and a side surface (). The top surface () is a mirror surface and the side surface () is a rough surface.

Synthetic quartz glass cavity member, synthetic quartz glass cavity lid, optical device package, and making methods

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 &#x3bc;m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Large-size synthetic quartz glass substrate, evaluation method, and manufacturing method

The invention provides a method for producing a synthetic quartz glass substrate, the method includes arranging spacers to be in contact with outer peripheral side surfaces of a synthetic quartz glass substrate, arranging plate materials to be in contact with the outer peripheral side surfaces of the spacers in a state that the plates are protruded from the surface of the substrate, and sandblasting the surface of the substrate.

Method for producing synthetic quartz glass substrate

In an imprint mold-forming synthetic quartz glass substrate () of rectangular shape having dimensions Land Lwith L&#x2265;L, a circular region is delineated on the substrate back surface by a circle of radius R with L&#x2212;2R&#x2265;10 mm. When approximation analysis is performed from the 1st to 8th term in the Zernike polynomials on the circular region, a coefficient of the 4th term is equal to or greater than &#x2212;(2R/100,000&#xd7;1) &#x3bc;m.

Imprint mold-forming synthetic quartz glass substrate

A circular mold-forming substrate of 125-300 mm diameter having a surface on which a topological pattern is to be formed is provided wherein the thickness of the substrate has a variation of up to 2 &#x3bc;m within a circle having a diameter of 125 mm.

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Joetsu, Japan

Masaki Takeuchi