Tokyo Electron Limited

Masaki Taira

Yuji Kamikawa

Koji Egashira

A substrate processing apparatus according to the present invention comprises: a processing part configured to process a substrate; a chemical-liquid storing container configured to store a chemical liquid; a chemical-liquid supply driving part configured to supply the chemical liquid from the chemical-liquid storing container into the processing part; a circulation line configured to circulate the chemical liquid stored in the chemical-liquid storing container; and a mixture generating part provided on the circulation line. An inert-gas supply source is configured to supply an inert gas into the mixture generating part. The mixture generating part is configured to mix the chemical liquid supplied from the chemical-liquid storing container and the inert gas supplied from the inert-gas supply source with each other so as to generate a gas-liquid mixture.

Substrate processing apparatus, substrate processing method, and storage medium storing a computer program for performing substrate processing method

In a substrate processing apparatus that supports substrates W by a plurality of holding members of a rotor to process the substrates W rotated by the rotor, any one of the holding members is provided with press devicesto apply pressures on the peripheries of the substrates W. Each press devicehas an abutting partfor contact with the periphery of the substrate W, a cylinder mechanismfor moving the abutting partbetween a position in contact with the periphery of the substrate W and another position apart from the periphery of the substrate W and a deformable partelastically deformed by the movement of the abutting partto isolate the cylinder mechanismfrom an atmosphere around the substrates W. Consequently, it is possible to provide the substrate processing apparatus and method that do not cause a diaphragm to be deformed excessively.

Substrate processing apparatus and method

The present invention provides a rotary shaft sealing mechanism having the seal between the rotary shaft and the seal ring improved, and a liquid processing apparatus including the rotary shaft sealing mechanism. The cleaning processing apparatuscomprises a rotorfor holding wafers W, an outer chamberand an inner chamberwhich can house the rotora spindlefor rotating the rotorand an outer cylindrical memberdisposed around the spindleA first sealing ringetc. of resins are provided in a ring memberconstituting the outer cylindrical memberA clearance between the spindleand the first sealing ringis adjusted by press inserting the spindleinto the first sealing ringetc. and rotating the spindlefor a prescribed period of time to abrade the fist sealing ringetc.

Growing community of inventors

Tosu, Japan

Masaki Taira