Taiyo Ink Manufacturing Co., Ltd.

Kanagawa University

Kanagawa University and Taiyo Ink Manufacturing Co., Ltd.

Masaki Sasaki

Atsushi Kameyama

Tadatomi Nishikubo

Masatoshi Kusama

Teruo Saito

Seiya Onodera

Miyako Ichikawa

An unsaturated monocarboxylic ester compound has at least two structures represented by the following general formula (1): wherein Rrepresents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms, and R, Rand Rindependently represent a hydrogen atom, an alkyl group of 1 to 6 carbon atoms, an aryl group, an aralkyl group, a cyano group, a fluorine atom, or a furyl group. A curable composition comprises (A) the unsaturated monocarboxylic ester compound having two or more structures represented by the general formula (1) mentioned above, (B) a polymerization initiator, and optionally (C) a diluent.

Unsaturated monocarboxylic ester compounds

A photocurable and thermosetting resin composition comprising (A) a photosensitive prepolymer having a carboxyl group in combination with at least two ethylenically unsaturated double bonds in its molecule, (B) a polymerization initiator, (C) a diluent, (D) an oxetane compound having at least two oxetanyl groups in its molecule, and (E) a curing promotor is developable with an alkaline solution and can be formulated as a one package preparation. Such a photocurable and thermosetting resin composition and a photosensitive dry film prepared by the use thereof are useful as various resist materials and electrical insulating materials, particularly as solder resists for printed circuit boards, interlaminar insulating materials for build-up multi-layer printed circuit boards, and the like.

Photocurable/therosetting resin composition, photosensitive dry film formed therefrom and method of forming pattern with the same

A photocurable and thermosetting resin composition comprises (A) an actinic energy ray-curable resin having at least one structure represented by the following general formula (1), (B) a-polymerization initiator, (C) a diluent, and (D) a polyfunctional oxetane compound. The actinic energy ray-curable resin mentioned above can be produced by causing the reaction of (a) a polyfunctional oxetane compound with (b) an unsaturated monocarboxylic acid and the subsequent reaction of (c) a polybasic acid anhydride with a primary hydroxyl group of the resultant modified oxetane resin (a'). wherein Rrepresents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms, R, Rand Rindependently represent a hydrogen atom, an alkyl group of 1 to 6 carbon atoms, an aryl group, an aralkyl group, a cyano group, a fluorine atom, or a furyl group, and X represents a polybasic acid anhydride residue.

Resin curable with actinic radiation, process for the production thereof, and photocurable and thermosetting resin composition

A printed circuit board that includes a solder resist has a photocurable and thermosetting resin composition which comprises (A) an actinic energy ray-curable resin having at least one structure represented by the following general formula (1), (B) a polymerization initiator, (C) a diluent, and (D) a polyfunctional oxetane compound. The actinic energy ray-curable resin mentioned above can be produced by causing the reaction of (a) a polyfunctional oxetane compound with (b) an unsaturated monocarboxylic acid and the subsequent reaction of (c) a polybasic acid anhydride with a primary hydroxyl group of the resultant modified oxetane resin (a'). wherein Rrepresents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms, R, Rand Rindependently represent a hydrogen atom, an alkyl group of 1 to 6 carbon atoms, an aryl group, an aralkyl group, a cyano group, a fluorine atom, or a furyl group, and X represents a polybasic acid anhydride residue.

An unsaturated monocarboxylic ester compound has at least two structures represented by the following general formula (1): wherein Rrepresents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms, and R, Rand Rindependently represent a hydrogen atom, an alkyl group of 1 to 6 carbon atoms, an aryl group, an aralkyl group, a cyano group, a fluorine atom, or a furyl group. A curable composition comprises (A) the unsaturated carboxylic ester compound having two or more structures represented by the general formula (1) mentioned above, (B) a polymerization initiator, and optionally (C) a diluent.

Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray

An unsaturated polyester compound having an ethylenically unsatureated group in its terminal and hydroxymethyl group in its side chain is obtained by the reaction of (a) a compound containing at least two oxetane rings in its molecule with (b) a compound containing at least two carboxyl groups in its molecule and (c) an unsaturated monocarboxylic acid in the presence of a reaction promotor in such a proportion that the ratio of said compound (b) to said compound (a) falls in the range of 0.1&#x3c;(b)/(a)&#x3c;1. BY further reacting (d) a polybasic acid anhydride with the resultant unsaturated polyester compound (A'), there is obtained an actinic energy ray-curable resin which is soluble in an aqueous alkaline solution. A photocurable and/or thermosetting composition is obtained by mixing the unsaturated polyester compound (A&#x2032;) and/or the actinic energy ray-curable resin with a polymerization initiator (B).

Unsaturated polyester compounds, resins curable with actinic energy ray, processes for the production thereof, and curable compositions

A photocurable and thermosetting resin composition comprises (A) an actinic energy ray-curable resin having at least one structure represented by the following general formula (1), (B) a polymerization initiator, (C) a diluent, and (D) a polyfunctional oxetane compound. The actinic energy ray-curable resin mentioned above can be produced by causing the reaction of (a) a polyfunctional oxetane compound with (b) an unsaturated monocarboxylic acid and the subsequent reaction of (c) a polybasic acid anhydride with a primary hydroxyl group of the resultant modified oxetane resin (a').wherein Rrepresents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms, R, Rand Rindependently represent a hydrogen atom, an alkyl group of 1 to 6 carbon atoms, an aryl group, an aralkyl group, a cyano group, a fluorine atom, or a furyl group, and X represents a polybasic acid anhydride residue.

Resins curable with actinic energy ray, process for the production thereof, and photocurable and thermosetting resin composition

Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with the same

A photosensitive resin composition and a method of forming a positive resist pattern by the use of the composition are disclosed. The photosensitive resin composition comprises (A) a resinous compound containing an acid-decomposing ester group, (B) a compound containing one ethylenically unsaturated bond in its molecule and possessing a group capable of forming a carboxylic acid via decomposition by the action of an acid, (C) a photo-acid generator, (D) a photo-radical polymerization initiator, and optionally (E) an epoxy resin. When this composition is applied to a substrate, exposed to an active energy ray of a wavelength enough to activate the photo-radical polymerization initiator (D) and not enough to activate the photo-acid generator (C) to radically polymerize the compound (B), selectively irradiated with an active energy ray of a wavelength enough to activate the photo-acid generator (C) and heated, the resinous compound (A) and the polymer of the compound (B) is thermally decomposed by the catalytic action of the acid generated by the photo-acid generator (C), with the result that the selectively irradiated part of the coating film will be rendered soluble in an aqueous alkaline solution. A positive resist pattern is formed by removing the selectively irradiated part by development. When the composition contains the epoxy resin (E), the coating film may be thermally cured.

Growing community of inventors

Asaka, Japan

Masaki Sasaki