Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hitachi, Ltd.

Other

Masaki Mizuochi

Shuichi Nakagawa

Hironori Ogawa

Motohiro Takahashi

Takanori Kato

Akira Nishioka

Naruo Watanabe

Tomotaka Shibazaki

Takaaki Kikuchi

Yoshimasa Fukushima

Hiroshi Tsuji

Akira Kojima

Junpei Hokari

Masayuki Arakawa

Tomokazu Kobayashi

Shoji Tomida

Toshinori Kobayashi

Masami Katsuyama

Hideki Tanaka

Toshihiko Shimizu

Masashi Fujita

Mitsuru Inoue

Yasuhiro Ando

Masaki Kurihara

Toshihiko Horiuchi

Masahiro Koyama

Kazuhiro Morita

Naoya Ishigaki

Nobuyuki Maki

Raifu Yamamoto

Tsukasa Sugawara

Nobuo Shibata

Kenta Nomura

Kentaro Shigeoka

Masao Saida

Daisuke Mutou

Hirofumi Motoshiromizu

Eisuke Kamide

Keiichiro Hosobuchi

A stage apparatus includes a lower stage that moves in a Y-axis direction, an upper stage that floats from the lower stage and moves at least in an X-axis direction orthogonal to the Y-axis direction, a heat exchanger that cools a Y table of the lower stage with a refrigerant, and a control device that controls an inclination of the lower stage with reference to the Y table cooled by the heat exchanger.

Stage apparatus and charged particle beam apparatus including stage apparatus

A charged particle beam device according to the present invention includes a first movement table and a second movement table disposed above the first movement table, measures a first relative position between a sample chamber and the first movement table, a second relative position between the sample chamber and the second movement table, and a third relative position between a lens barrel and a sample, and corrects a relative position between the first movement table and the second movement table according to the first relative position and the second relative position.

Charged particle beam device

A semiconductor processing apparatus according to the present invention includes a main body cover that covers a main body device and a control device. The main body cover has a transfer opening for transferring a semiconductor, and the main body cover further has an intake port that generates an air flow in a horizontal direction inside the main body cover.

Ventilated semiconductor processing apparatus

Apparatus for evaluating semiconductor substrate

Semiconductor substrate transfer apparatus

Since wires connected to a linear motor are routed in a vacuum sample chamber, outgassing is generated from wire coating and efficiency of assembly operations is reduced. Further, there is a problem that thrust generation efficiency of the linear motor is reduced when a gap between a coil and a permanent magnet of the linear motor cannot be small. In order to solve the above problems, a linear motor for vacuum is provided, the linear motor for vacuum including: a mover having a permanent magnet; and a stator having a support member to which a coil is fixed, in which the support member includes a vacuum sealing portion that vacuum seals with a wall surface of a vacuum sample chamber, and a feed-through for supplying a current to the coil provided in the vacuum sample chamber.

Linear motor for vacuum and vacuum processing apparatus

An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.

A charged particle beam apparatus includes a sample stage on which a sample is mounted, a control device that controls to drive the sample stage, a linear scale that detects a position of the sample stage, laser position detection means for detecting the position of the sample stage, an optical microscope that observes the sample mounted on the sample stage, and a barrel that irradiates the sample mounted on the sample stage with an electron beam, and generates a secondary electron. Image data of a first correction sample mounted on the sample stage is acquired by the optical microscope, and position data of the sample stage is detected by the laser position detection means. The sample stage is positioned with respect to the barrel based on the image data acquired by the optical microscope and the position data of the sample stage detected by the laser position detection means.

Charged particle beam apparatus, sample alignment method of charged particle beam apparatus

A stage includes a sample table on which a sample is placed, a first drive mechanism moving the sample table in a first direction; a position measurement element measuring a position in the first direction that is a driving direction of the sample table. The stage also has a scale element having a scale measurement axis that is parallel to a first measurement axis in the first direction based on the position measurement element and is different from the first measurement axis in height, and measuring the position of the sample table in the first direction. A controller calculates the orientation of the sample table by using a measurement value by the position measurement element and a measurement value by the scale element and correcting the Abbe error of the sample table.

Stage apparatus and charged particle beam apparatus

Provided is a stage apparatus that reduces thermal deformation and temperature rise in an upper table on which a sample is mounted and a charged particle beam apparatus including the stage apparatus. The stage apparatus includes: an upper stage that moves an upper table on which a sample is mounted in a first direction; a middle stage that moves a middle table on which the upper stage is mounted in a second direction orthogonal to the first direction; and a lower stage that moves a lower table on which the middle stage is mounted in a third direction orthogonal to the first direction and the second direction. The upper table and the middle table use a material having a smaller thermal expansion coefficient than in a material of the lower table, and the lower table uses a material having higher thermal conductivity than in the material of the upper table and the middle table.

Stage apparatus, and charged particle beam apparatus

The purpose of the present invention is to provide a charged particle radiation device capable of performing appropriate vibration suppression control in accordance with a device condition. To achieve the purpose, proposed is a charged particle radiation device provided with: a sample stage for supporting a sample irradiated with a charged particle beam emitted from a charged particle source; and a vacuum chamber for placing the atmosphere in which the sample is disposed in a vacuum state. The charged particle radiation device is provided with: a sensor for detecting vibrations transmitted to the charged particle radiation device; a vibration addition mechanism for vibrating the charged particle radiation device; and a control device for performing feedback control for the vibration addition mechanism in accordance with detection by the sensor, wherein the control device changes a feedback gain of the feedback control in accordance with the type of instruction in a control sequence of the charged particle radiation device.

Charged particle radiation device

Provided is a charged particle beam apparatus including: an XY stage on which a sample is placed; a charged particle beam source which irradiates the sample with a charged particle beam; a detector which detects charged particles emitted from the sample upon the irradiation with the charged particle beam; an image generator which generates an SEM image of the sample based on a detection signal output by the detector; and a controller configured to set control parameters based on a movement starting point and a movement ending point of the XY stage and control a driving unit for moving the XY stage according to the control parameters.

Charged particle beam apparatus comprising a controller to set control parameters based on movement of the sample stage

The present invention relates to a charged particle beam device capable of suppressing table deformation caused by movement of a rolling element of a guide with a simple configuration, and a strain isolation guide structure, a stage using the guide structure, and a charged particle beam device using the stage are proposed, the strain isolation guide structure being characterized in that, in a sample stage including a linear guide including a carriage (), a rolling element, and a guide rail (), and a table (), the carriage () and the table () are connected via an adapter () as an elastically deformable member.

Stage device and charged particle beam device

To provide a lightweight and highly rigid stage device that can move in X and Y directions and a Z direction, and a charged particle beam device including the stage device. A stage device includes a chuck that is loaded with a sample, an XY stage that moves in X and Y directions, and a Z stage that moves in a Z direction. The Z stage includes: an inclined part that is fixed to the XY stage and includes an inclined surface inclined with respect to an XY plane; a movement part that moves on the inclined surface; and a table that is fixed to the movement part and is provided with the a plane parallel to the XY plane.

Growing community of inventors

Tokyo, Japan

Masaki Mizuochi