Ricoh Company, Ltd.

Nikon Corporation

Mitsubishi Electric Corporation

Mitsubishi Denki Kabushiki Kaisha

Nec Corporation

Nissan Motor Company Limited

Nec Infrontia Corporation

The Japan Steel Works, Ltd.

Masaki Kato

Kinya Kato

Katsuyuki Yamada

Masahiko Fujita

Hiroyoshi Sekiguchi

Yoshihito Asao

Masashi Tanaka

Hiroyuki Akita

Hiroshi Shirasu

Hiroshi Chiba

Kazunori Ito

Tohru Kiuchi

Hiroshi Deguchi

Masaru Shinkai

Kiyoshi Yamaguchi

Michiaki Shinotsuka

Kei Nara

Hiroko Ohkura

Yuki Nakamura

Satoshi Mizukami

Eiko Hibino

Takahiko Kuroda

Dai Nakajima

Hiroshi Miura

Masao Kikuchi

Yoshikazu Akiyama

Yoshitaka Hayashi

Noboru Sasa

Yasushi Mizuno

Toshishige Fujii

Kanshi Abe

Makoto Harigaya

Tomoaki Oikawa

Eiichi Taniguchi

Hitoshi Isoda

Yuji Shirakata

Naohide Maeda

Masahiko Nakayama

Takeshi Suzuki

Hideo Mizutani

Takashi Matsuda

Tomoyuki Watanabe

Toshiaki Kashihara

Tomohide Hamada

Takeshi Sano

Hajime Yuzurihara

Ichiro Nakajima

Toshiaki Masuda

Kenta Fujii

Masato Kumazawa

Shinya Narumi

Tatsuya Fukase

Kazuyasu Sakamoto

Takuya Oga

Mikiko Takada

Mikiko Abe

Masayuki Fujiwara

Hideaki Nishimura

Teruo Miyamoto

Jun Tahara

Yoshiaki Kito

Masakazu Hori

Yukitoshi Tajima

Tomoaki Shimano

Toshio Arai

Motoo Koyama

Manabu Toguchi

Mitsuru Shingyohuchi

Osamu Kazama

Takeshi Kibe

Ikutaro Noji

Yasunari Hino

Kazuaki Saiki

Tatsuo Fukui

Shinsuke Asada

Masafuku Akatsu

Masataka Mohri

Yasuo Sawada

Toshihide Sasaki

Masaichi Murakami

Naoya Kondo

Masataka Yoshiike

Daisuke Nakashima

Nobuaki Uehara

Tsutomu Yamazaki

Tetsuo Kikuchi

Hiroyuki Yoshihara

Shinji Mine

Takao Mitsui

Yuetsu Watanabe

Shinsuke Miura

Tsuyoshi Narabe

Masami Seki

Mitsuya Matsubara

Hiromitsu Nakano

Hitoshi Usami

Hitoshi Hatada

An exposure apparatus that scans and exposes a substrate via an optical modulator in which a plurality of elements are controlled according to an image pattern, the exposure apparatus includes a first stage that supports a first substrate, a second stage that supports a second substrate different from the first substrate, a measurement part that measures information about the second substrate, and a generation part that generates control data, which controls the plurality of elements during scanning and exposing the second substrate, based on the information during an exposure process of the first substrate, wherein the measurement part measures the information about the second substrate during the exposure process of the first substrate.

Exposure apparatus, method for manufacturing device, method for manufacturing flat panel display, and exposure method

A stretching machine configured to stretch a resin film includes a plurality of link mechanisms coupled to constitute an endless chain and a railon which the link mechanisms run. The railof the stretching machine has a slitin a side surface. The slitextends in a direction inclined with respect to a direction in which the railextends.

Stretching machine and rail for stretching machine

An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

Optical device, exposure device, method for manufacturing flat panel display, and method for manufacturing device

A pattern drawing device is provided with: a first cylindrical lens on which a beam from a light source device is incident and which has an anisotropic refractive power for converging, in a sub-scanning direction orthogonal to a main scanning direction, the beam traveling toward a reflection surface of a polygon mirror; an f&#x3b8; lens system for causing the beam having been deflected by the reflection surface of the polygon mirror to be incident thereon, and for condensing the beam as a spot light on a surface of an object to be irradiated; and a second cylindrical lens having an anisotropic refractive power for converging, in the sub-scanning direction, the beam traveling toward the surface after being emitted from the f&#x3b8; lens system.

Pattern drawing device

A liquid discharge head includes a plurality of nozzles configured to discharge a liquid, a plurality of pressure chambers respectively communicating with the plurality of nozzles, a plurality of common-supply branch channels each communicating with two or more of the plurality of pressure chambers, a common-supply main channel communicating with each of the plurality of common-supply branch channels, a plurality of common-collection branch channels each communicating with two or more of the plurality of pressure chambers, and a common-collection main channel communicating with each of the plurality of common-collection branch channels. The plurality of nozzles is arrayed in a two-dimensional matrix in a first direction and a second direction intersecting with the first direction, the plurality of common-supply branch channels and the plurality of common-collection branch channels are alternately arranged in the second direction.

Liquid discharge head, head module, head device, liquid discharge device, and liquid discharge apparatus

An exposure device that draws a pattern on a substrate by shining a beam from a light source device on substrate and scanning the beam in a main scanning direction while varying the intensity of beam according to pattern information, including: a scanning unit having a beam scanning unit that includes a polygonal mirror whereby the beam is oriented to scan the beam, and light detector for photoelectric detection of reflected light generated when beam is shined on substrate; an electro-optical element for controlling the beam's intensity modulation according to pattern information such that at least part of second pattern to be newly drawn is drawn on top of at least part of first pattern formed on substrate; and a measurement unit measuring relative positional relationship between the first and second pattern on the basis of a detection signal output by the detector while second pattern is drawn on substrate.

Pattern drawing device, pattern drawing method, and method for manufacturing device

A power semiconductor device is such that a notch provided, along a longitudinal end face of an inner lead, in a region of a lead frame to which the inner lead is bonded. A resistor is disposed, adjacent to the inner lead, on the same side as the notch with respect to the inner lead, and a distance between the inner lead and the notch is set to be smaller than a distance between the inner lead and the resistor, and thereby the inner lead, even when shifted in position, comes into no contact with the resistor. Because of this, it is no more necessary that a space be provided around the inner lead taking into consideration a positional shift of the inner lead, and it is possible to secure the heat release area of power semiconductor chips accordingly, and thus to obtain the small-sized and high-powered power semiconductor device.

Power semiconductor device

A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.

Substrate processing apparatus, processing apparatus, and method for manufacturing device

A liquid discharge head includes a plurality of nozzles configured to discharge a liquid, the plurality of nozzles arrayed in a two-dimensional matrix forming a plurality of nozzle groups, a plurality of pressure chambers communicating with the plurality of nozzles, respectively, a plurality of supply ports communicating with the plurality of pressure chambers, respectively, a plurality of common-supply branch channels communicating with two or more of the plurality of pressure chambers through the plurality of supply ports, respectively, a plurality of collection ports communicating with the plurality of pressure chambers, respectively, and a plurality of common-collection branch channels communicating with two or more of the plurality of pressure chambers through the plurality of collection ports, respectively.

A liquid discharge head includes nozzles, pressure chambers, individual supply channels, individual collection channels common supply channel branches, and common collection channel branches. The common supply channel branches communicate with two or more of the individual supply channels. The common collection channel branches communicate with two or more of the individual collection channels. The nozzles are two-dimensionally arranged in a matrix and arranged in at least a first direction and a second direction intersecting with the first direction at an inclination. The common supply channel branches and the common collection channel branches extend in the first direction. The common supply channel branches and the common collection channel branches are alternately arranged in the second direction. An arrangement interval between the common supply channel branches and the common collection channel branches is equal to or more than twice an arrangement interval between the nozzles arranged in the second direction.

Liquid discharge head, head module, head unit, liquid discharge device, and liquid discharge apparatus

Provided is a small-sized power semiconductor device in which interference between power modules adjacently disposed is prevented and the areas of the gaps occurring between the power modules are reduced. In a power semiconductor device formed by adjacently disposing power modules in an arc shape on a heat sink, each of which power modules is obtained by sealing, with a mold resin, a switchable power semiconductor chip, a lead frame in which potential leads and signal terminals connected to the power semiconductor chip are formed, and a metallic inner lead electrically connecting an upper surface electrode of the power semiconductor chip and the lead frame, any one of the adjacent power modules is formed in a pentagonal shape having, at a portion adjacent to the other power module, an oblique sideobtained by cutting out one corner of a quadrangle.

Power semiconductor device and power module

A liquid discharge head includes a plurality of nozzles to discharge a liquid, a plurality of pressure chambers communicating with the plurality of nozzles, respectively, a plurality of individual supply channels communicating with the plurality of pressure chambers, respectively, a plurality of common-supply branch channels each having a side face and a bottom face and communicating with two or more of the plurality of individual supply channels, respectively, and a common-supply main channel communicating with the plurality of common-supply branch channels. The plurality of common-supply branch channels includes a curved portion on a corner between the side face and the bottom face of each of the plurality of common-supply branch channels along a direction of liquid flow in the plurality of common-supply branch channels.

Liquid discharge head, head module, liquid discharge device, and liquid discharge apparatus

A liquid discharge head includes a plurality of nozzles to discharge a liquid; a plurality of pressure chambers communicating with the plurality of nozzles; a plurality of individual supply channels communicating with the plurality of pressure chambers; a plurality of supply ports communicating with the plurality of individual supply channels; a plurality of common-supply branch channels communicating with two or more of the plurality of individual supply channels through the plurality of supply ports; a common-supply main channel communicating with the plurality of common-supply branch channels; and a plurality of supply-side dampers, each of the plurality of supply-side dampers forming a part of a wall of each of the plurality of common-supply branch channels.

Liquid discharge head, liquid discharge device, liquid discharge apparatus, and head module

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Tokyo, Japan

Masaki Kato