Seiko Epson Corporation

Asahi Kasei E-materials Corporation

Sumitomo Bakelite Company Limited

Sumitomo Heavy Industries Ion Technology Co., Ltd.

Sen Corporation

Hitachi, Ltd.

Hitachi-high-technologies Corporation

Sen Corporation, an Shi and Axcelis Company

A.i. Soft, Inc.

Asahi Kasei Kabushiki Kaisha

Masaki Ishikawa

Hiroshi Murata

Yuki Uchida

Hiroshi Hatayama

Junya Goto

Hirotsuna Miura

Mitsuaki Kabasawa

Takanori Yagita

Hiroyuki Kariya

Takeshi Kurose

Tamotsu Orihara

Taichi Koide

Kazunori Shimoyachi

Yasuaki Takada

Hisashi Nagano

Mitsukuni Tsukihara

Masanobu Kobayashi

Shiro Ninomiya

Junichiro Shinozaki

Michiro Sugitani

Tetsuya Kudo

Daisuke Inagaki

Sumiya Miyake

Akihiro Ochi

Takekuni Yamamoto

Toshio Yumiyama

Masami Sakamoto

Junichi Murakami

Yoshihiro Nishikawa

Noboru Ninomiya

Masaki Matsumoto

Tatsuhiro Hasu

Akihito Tanimoto

Yasuharu Okamoto

Yusuke Ueno

Takashi Nishi

Hidenori Iwasawa

Hideki Morikawa

Yoshiaki Inda

The sensor information acquisition unit acquires an angular velocity around an axis of a shaft portion of an exercise instrument from a sensor unit. An exercise analysis unit detects a timing of an impact of the exercise instrument. A calculation unit calculates a distance between a standard position set on a hitting surface of the exercise instrument and a position of the hitting based on the angular velocity at the time of an impact.

Exercise analysis device, exercise analysis method, program, recording medium, and exercise analysis system

An ion implantation method includes measuring a beam energy of an ion beam that is generated by a high-energy multistage linear acceleration unit operating in accordance with a tentative high-frequency parameter, adjusting a value of the high-frequency parameter based on the measured beam energy, and performing ion implantation by using the ion beam generated by the high-energy multistage linear acceleration unit operating in accordance with the adjusted high-frequency parameter. The tentative high-frequency parameter provides a value different from a value of the high-frequency parameter for achieving a maximum acceleration in design to a high-frequency resonator in a part of stages including at least a most downstream stage. The adjusting includes changing at least one of a voltage amplitude and a phase set for the high-frequency resonator in the part including the at least most downstream stage.

Ion implantation method and ion implantation apparatus

A separator for nonaqueous electrolyte batteries having multilayer porous membrane, having a polyolefin microporous membrane and a porous layer having an inorganic filler, disposed on at least one side of the polyolefin microporous membrane, wherein, in pores with an area of 0.01 &#x3bc;mor more in a cross section of the porous layer, the pores having an angle &#x3b8; formed between a major axis of each pore and an axis in parallel with an interface between the microporous membrane and the porous layer in a range of 60&#xb0;&#x2264;&#x3b8;&#x2264;120&#xb0; occupying a proportion of 30% or more therein.

Separator including polyolefin microporous membrane and inorganic porous layer, and nonaqueous electrolyte battery using the same

A multilayer porous membrane comprising a porous membrane containing a polyolefin resin as a main component; and a porous layer containing an inorganic filler and a resin binder and laminated on at least one surface of the porous membrane; wherein the porous membrane has an average pore size d=0.035 to 0.060 &#x3bc;m, a tortuosity &#x3c4;=1.1 to 1.7, and the number B of pores=100 to 500 pores/&#x3bc;m, which are calculated by a gas-liquid method, and the porous membrane has a membrane thickness L=5 to 22 &#x3bc;m.

Porous membrane and multilayer porous membrane

The present invention is a method for decomposing a polymer material by chemically decomposing a polymer material containing a first monomer and a second monomer in a mixture of the polymer material with the first monomer or a derivative of the first monomer to produce a chemical raw material. A relationship between a proportion of number of molecules of the second monomer to number of molecules of the first monomer in a reaction system for decomposing the polymer material and the molecular weight of the chemical raw material produced in the reaction system is acquired in advance (S). Subsequently, an addition mount of the derivative of the first monomer to be added to the polymer material is determined based on the above relationship (S). The first monomer in the addition amount determined is then mixed with the polymer material (S).

Method for decomposing polymer material, method for producing recycled resin, and method for recovering inorganic filler

An ion implantation method includes transporting ions to a wafer as an ion beam, causing the wafer to undergo wafer mechanical slow scanning and also causing the ion beam to undergo beam fast scanning or causing the wafer to undergo wafer mechanical fast scanning in a direction perpendicular to a wafer slow scanning direction, irradiating the wafer with the ion beam by using the wafer slow scanning in the wafer slow scanning direction and the beam fast scanning of the ion beam or the wafer fast scanning of the wafer in the direction perpendicular to the wafer slow scanning direction, measuring a two-dimensional beam shape of the ion beam before ion implantation into the wafer, and defining an implantation and irradiation region of the ion beam by using the measured two-dimensional beam shape to thereby regulate the implantation and irradiation region.

Separator for nonaqueous electrolyte batteries containing a porous membrane

A beamline unit of an ion implanter includes a steering electromagnet, a beam scanner, and a beam collimator. The beamline unit contains a reference trajectory of an ion beam. The steering electromagnet deflects the ion beam in an x direction perpendicular to a z direction. The beam scanner deflects the ion beam in the x direction in a reciprocating manner to scan the ion beam. The beam collimator includes a collimating lens that collimates the scanned ion beam in the z direction along the reference trajectory, and the collimating lens has a focus at a scan origin of the beam scanner. A controller corrects a deflection angle in the x direction in the steering electromagnet so that an actual trajectory of the deflected ion beam intersects with the reference trajectory at the scan origin on an xz plane.

Ion implanter and ion implantation method

An image processing device includes a compression circuit adapted to perform compression of image data after sorting the pixels in an arrangement included in a plurality of lines in image data into a plurality of lines corresponding respectively to color components, a memory adapted to store the image data thus compressed, and an expansion circuit adapted to expand the image data thus compressed to restore the arrangement of the pixels.

Image processing device and electronic apparatus using the same

A multilayer porous film, comprising a porous layer including inorganic particles and a resin binder on at least one surface of a porous film containing a polyolefin resin as a main component, wherein the inorganic particles contain an aluminum silicate compound as a main component.

Multilayer porous film

A vertical profile, a horizontal profile, and an integrated current value of an ion beam are measured by a plurality of stationary beam measuring instruments and a movable or stationary beam measuring device. At a beam current adjustment stage before ion implantation, a control device simultaneously performs at least one of adjustment of a beam current to a preset value of the beam current, adjustment of a horizontal beam size that is necessary to secure uniformity of the horizontal ion beam density, and adjustment of a vertical beam size that is necessary to secure the uniformity of the vertical ion implantation distribution on the basis of a measurement value of the stationary beam measuring instruments and the movable or stationary beam measuring device.

Ion implantation apparatus and control method thereof

An image processor includes a hue region judging section judging which one of a plurality of hue regions corresponds to a hue and a converting section obtaining a correction value by using the hue to correct the hue based on the correction value. The converting section obtains a first difference value by using a difference between the hue and a first reference value, obtains a second difference value by using a difference between a second reference value and the first difference value, and obtains the correction value by using the second difference value. The hue is corrected based on the correction value.

Image processor, integrated circuit device, and electronic apparatus

A decomposition reaction apparatus for the decomposition treatment of a thermosetting resin, which comprises a reaction apparatus comprising an introduction section for introducing a resin composition containing the thermosetting resin and a solvent containing a monomer component of the thermosetting resin or a component similar to the monomer component, a decomposition reaction section for heating and pressuring the resin composition and the above solvent so as for the solvent to have a supercritical state or a subcritical state, to thereby prepare a treated and recovered product containing a recycled resin formed by the reduction of the molecular weight of the above thermosetting resin, and a discharge section for discharging the treated and recovered product. In the above reaction apparatus, the introduction of the resin composition and the solvent, the decomposition treatment of the thermosetting resin in the decomposition reaction section and the discharge of the treated and recovered product from the discharge section are all carried out continuously, and therefore, a raw material for a recycled resin composition using an industrial or general waste containing a thermosetting resin as the above resin composition can be produced continuously.

Decomposition reaction apparatus, system for producing raw material for recycled resin composition, method for producing raw material for recycled resin composition, raw material for recycled resin composition, and formed article

Growing community of inventors

Tokyo, Japan

Masaki Ishikawa