Canon Kabushiki Kaisha

Masaki Imai

Yuki Saito

Takafumi Miyaharu

Kazuki Ota

An exposure apparatus including an obtainment unit configured to obtain, for each of a plurality of exposure regions on a substrate, surface positions in a height direction in the exposure region, and a control unit configured to control, based on the obtained surface positions, driving of a substrate stage in the height direction, wherein the control unit obtains an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region from the obtained surface positions obtained, and for a first exposure region for which information related to the approximate surface does not exceed a predetermined range, controls the driving based on a correction value related to the driving obtained from an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region that has been exposed prior to the first exposure region.

Exposure apparatus, exposure method, and method of manufacturing article

The present invention provides a lithography apparatus which forms a pattern on a substrate with a beam, the apparatus comprising a stage configured to hold the substrate and be movable, and a controller configured to control focus driving of the stage based on a measurement value obtained for the focus driving with respect to a measurement point on the substrate and a correction value for the measurement value, wherein the controller is configured to generate the correction value so as to reduce a focus error in a case where the stage is driven based on the measurement value.

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Saitama, Japan

Masaki Imai