Matsushita Electric Industrial Co., Ltd.

Masakazu Yamamoto

Norio Miyatake

Motoyoshi Murakami

Yoshihiko Kudoh

Hidetsugu Kawabata

In a method of producing a deposition film of a composite material, a plurality of sputtering targets each containing one of a plurality of different components are disposed separately in a vacuum chamber. A substrate is subjected to sputtering from the sputtering targets while being moved at an adequately high speed relative to a deposition rate from each sputtering target so that extremely thin layers of the respective components are sequentially stacked repeatedly a plurality of times to thereby form a deposition film of a composite material in which the plurality of different components are mixed uniformly.

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Kawanishi, Japan

Masakazu Yamamoto