Sumitomo Chemical Company, Limited

Masakazu Sumida

Kazuhiro Yamazaki

Noriaki Suyasu

Akira Nishitani

Shota Konishi

Kazuaki Yoshimura

Noboru Kondo

Tomohiro Mizumoto

Kiyoshi Muto

Kensuke Maekawa

Shoji Inukai

Provided are an acrylic resin layer laminate having excellent impact resistance and a manufacturing method of the same. The laminate includes a first acrylic resin layer, a thermoplastic resin layer, and a second acrylic resin layer in this order, in which the thermoplastic resin layer contains 71% or more of a component having a spin-spin relaxation time Tin pulse NMR measurement of 0.03 ms or longer. The manufacturing method of the laminate includes: discharging, from a die, a molten resin laminate containing at least a melt of a resin composition (1) containing a (meth)acrylic resin, a melt of a resin composition containing a thermoplastic resin, and a melt of a resin composition (2) containing a (meth)acrylic resin; and cooling the discharged molten resin laminate to obtain a laminate.

Laminated body and method for producing laminated body

Provided is a molded body having excellent heat resistance. A composition containing methyl methacrylate, methyl isobutyrate and methyl acrylate, in which a content of methyl methacrylate is 99.5% by mass or more, a concentration of methyl isobutyrate is 20 ppm by mass to 300 ppm by mass, and a concentration of methyl acrylate is 5 ppm by mass to 200 ppm by mass.

Composition

A continuous polymerization apparatus uses at least a first reactor and a second reactor (). Each of the reactors () includes at least one supply port (, and), an effluent port (), and a temperature detecting means (T, T), each of which detects the temperature in the reactor. The supply port () of the first reactor () is connected to supply sources () of a raw material monomer and a polymerization initiator, and the effluent port () is connected to the first supply port () of the second reactor () through a connection line (). The second supply port () of the second reactor () is connected to a replenishing line () that supplies a new raw material monomer to the second reactor.

Continuous polymerization device and method for producing polymer composition

A continuous polymerization apparatus uses at least a first reactor and a second reactor (). Each of the reactors () comprises a supply port () and an effluent port (). The supply port () of the first reactor () is connected to supply sources () of a raw material monomer and a polymerization initiator, and the effluent port () thereof is connected to the supply port () of the second reactor () by a connection line (). The connection line () is combined with a replenishing line () through an injection valve () at a combining part. The injection valve () comprises, in a full closure state thereof, a clearance that may cause a fluid comprising at least the raw material monomer to flow from the replenishing line () to the connection line ().

Continuous polymerization device, method for producing polymer composition, and injection valve

Continuous polymerization apparatus including a first reactor of a complete mixing type and a second reactor of a complete mixing type (). Each of the reactors () is provided with a supply port (), an effluent port (), and a temperature detecting means (T) for detecting a temperature in the reactor, wherein the supply port () of the first reactor () is connected to the supply sources () of a raw material monomer and a polymerization initiator, and the effluent port () of the first reactor is connected through a connection line () to the supply port () of the second reactor (). Connection line () is combined with a secondary line (') for supplying a raw material monomer at a combining part (M) located between the effluent port () of the first reactor () and the supply port () of the second reactor ().

Continuous polymerization apparatus and process for producing polymer composition

The present invention provides a filter for an image display device comprising a resin layer having a thickness of about 1 mm or less containing therein (A) at least one compound selected from a compound of the following formula (1) and the following formula (2):wherein Rto R, Zand Zeach independently represent an appropriate substituent, Lto Leach independently represent an aromatic ring optionally having a substituent, and Xrepresents a counter anion; and (B) a compound having an absorption peak of light in the wavelength range from about 780 nm to about 1200 nm. This filter for an image display device is excellent in contrast and color reproducibility of an image and also in durability, and is suitably used for a plasma display panel.

Growing community of inventors

Ehime, Japan

Masakazu Sumida