Semiconductor Energy Laboratory Co., Ltd.

Masakazu Odaka

Toru Takayama

Shigenori Hayashi

Takashi Inushima

Naoki Hirose

Shunpei Yamazaki

Toshimitsu Konuma

Akira Mase

Toshio Watanabe

Masahiko Sato

Hiroyuki Sakayori

Ippei Kobayashi

Toshiharu Yamaguchi

Akio Osabe

Osamu Aoyagi

Kaoru Tabata

Chizuru Isigaki

Chizuru Ishigaki

An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.

Liquid crystal device and method for manufacturing same with spacers formed by photolithography

An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.

CVD apparatus

Method of forming a film on a substrate

Method for forming a multi-layer planarization structure

Growing community of inventors

Akita, Japan

Masakazu Odaka