National Institute of Advanced Industrial Science and Technology

Masakazu Mukaida

Hiroyuki Suda

Shigeki Hara

Nobuo Hara

Yasuhisa Naitoh

Kenji Haraya

Qingshuo Wei

Takao Ishida

A thermoelectric material is manufactured by a manufacturing process including annealing at an annealing temperature from 125&#xb0; C. to 200&#xb0; C. and for an annealing time from 5 minutes to 12 hours applied to a substance selected from the group consisting of conductive polymer, polystyrene sulfonate (PSS), tosylate (TOS), chloride and perchlorate and a substance as solvent selected from the group consisting of ethylene glycol, ethanol, dimethyl sulfoxide and isopropanol.

Thermoelectric material and thermoelectric module

An apparatus for evaluating gas barrier properties, containing a polymer-containing support for supporting a sample, a chamber on a permeation side, and a detection unit, in which the support is connected with an opening of the chamber on the permeation side, and in which glass transition point of the polymer contained in the support is 100&#xb0; C. or higher.

Apparatus and method for evaluating gas barrier properties

An apparatus for evaluating gas barrier properties, containing a support () for supporting a sample, a chamber on a permeation side, and a detection unit, in which the support is connected with an opening of the chamber on the permeation side, and in which water vapor-transmission rate of the support is 1&#xd7;10mol/msPa to 1&#xd7;10mol/msPa.

The hydrogen separation device comprises a laminate formed by laminating and integrating a hydrogen separation layer, a mixed gas layer kept adjacent to one surface of the hydrogen separation layer and having a mixed gas flow path, and a transmitted gas layer kept adjacent to the other surface of the hydrogen separation layer and having a transmitted gas flow path, and a vessel containing the laminate therein and filled with a buffer gas, wherein a buffer space is provided between the laminate and the inner wall of the vessel in which a buffer gas can reach at least one end face of the laminate in the lamination direction, and wherein the pressure in the buffer space is equal to or higher than the higher one of the pressure in the mixed gas flow path and the pressure in the transmitted gas flow path.

Growing community of inventors

Tsukuba, Japan

Masakazu Mukaida