Horiba Stec, Co., Ltd.

Horiba, Ltd.

Tokyo Electron Limited

Masakazu Minami

Yuhei Sakaguchi

Toru Shimizu

Daisuke Hayashi

Masaki Inoue

Kotaro Takijiri

Katsumi Nishimura

Takeshi Akamatsu

Motonobu Takahashi

Hiroshi Nishizato

Atsuko Teraoka

Kazuhide Hasebe

Atsushi Endo

Nobutake Nodera

Kyoji Shibuya

Yuichi Furuya

Sotaro Kishida

Akira Kuwahara

Yoshiaki Nakata

Makoto Umeki

Masayuki Tanaka

Makoto Yoshida

The present invention is a gas analysis device that measures a concentration or partial pressure of a halide contained in a material gas used in semiconductor manufacturing process or a by-product gas generated in semiconductor manufacturing process with good accuracy, the device being for analyzing a concentration or partial pressure of a halide contained in a material gas used in a semiconductor manufacturing process or a by-product gas generated in a semiconductor manufacturing process, the device including a gas cell into which the material gas or the by-product gas is introduced, a laser light source that irradiates the gas cell with laser light whose wavelength is modulated, a light detector that detects the laser light transmitted through the gas cell, and a signal processing unit that calculates the concentration or partial pressure of the halide by using a light absorption signal obtained from an output signal of the light detector.

Gas analysis device and gas analysis method

Provided are a gas cell into which a gas is introduced, a temperature control block configured to control a temperature of the gas cell, and a pressure sensor configured to measure a pressure inside the gas cell. The pressure sensor is built into the temperature control block and/or the gas cell.

Gas analysis apparatus and gas analysis method

In order to prevent cracking of a window material in manufacturing an optical measurement cell that satisfies various performances required for airtightness, heat resistance, and the like by atomic diffusion bonding, an optical measurement cell into which a sample is introduced includes a light transmission window through which light is transmitted, and includes a window material forming the light transmission window, and a flange member to which the window material is bonded via a metal thin film, and a ratio of a thermal expansion coefficient of the flange member to a thermal expansion coefficient of the window material is 0.5 times or more and 1.5 times or less.

Optical measurement cell, optical analyzer, window forming member, and method of manufacturing optical measurement cell

In order to provide an absorbance analysis apparatus for DCR gas that can measure a concentration of a DCR gas by separating absorbance of the DCR gas alone even in a mixed gas consisting of the DCR gas and CO gas whose absorption spectrum overlaps each other, the absorbance analysis apparatus for DCR gas comprises a DCR filterthat is configured to transmit a light in a first wavenumber domain including an absorbance peak of the DCR gas, a CO filterthat is configured to transmit a light in a second wavenumber domain that is different from the first wavenumber domain, and a DCR gas volume calculatorthat is configured to calculate volume of the DCR gas based on a first absorbance measured by the light transmitted through the DCR filterand a second absorbance measured by the light transmitted through the CO filter

Absorbance analysis apparatus for DCR gas, absorbance analysis method for DCR gas, and absorbance analysis program recording medium on which program for DCR gas is recorded

In order to provide a concentration control apparatus that, without adding any new sensors or the like, makes it possible to accurately estimate a quantity of source consumed inside a vaporization tank, and to perform highly accurate concentration control in accordance with the remaining quantity of source, there is provided a concentration control apparatus that, in a vaporizer that is equipped with at least a vaporization tank containing a liquid or solid source, a carrier gas supply path that supplies a carrier gas to the vaporization tank, and a source gas extraction path along which flows a source gas which is created by vaporizing the source and is then extracted from the vaporization tank, controls a concentration of the source gas and includes a concentration monitor that is provided on the source gas extraction path, and outputs output signals in accordance with a concentration of the source gas.

Concentration control apparatus, source consumption quantity estimation method, and program recording medium on which a program for a concentration control apparatus is recorded

In order to inhibit overshoot in the concentration of a source gas immediately after a gas supply period starts, there is provided a vaporization device that is equipped with a vaporization tank that holds a liquid or a solid source, a carrier gas supply path that supplies carrier gas to the vaporization tank, a source gas extraction path along which flows a source gas which is obtained by vaporizing the source and which is extracted from the vaporization tank, a concentration monitor that is provided on the source gas extraction path, and a concentration control mechanism that is provided with a fluid controller which controls a concentration of the source gas extracted from the source gas extraction path. This vaporization device alternates between supplying the source gas and stopping the supply of the source gas.

Vaporization device, film formation device, program for a concentration control mechanism, and concentration control method

In order to make it possible to conduct a zero calibration even though an interference gas exists in a measurement area of a detector, a light absorbance analysis apparatus includes a detector that detects an intensity of light that transmits a gas, a total pressure sensor that measures a total pressure of the gas, an absorbance calculating part that calculates an absorbance based on an output value of the detector and a previously set zero reference value, a partial pressure&#x2014;absorbance relation storing part that stores a partial pressure&#x2014;absorbance relational data that indicates a relationship between a partial pressure of an interference gas that exists in a measurement area of the detector and an absorbance calculated by the absorbance calculating part, and a partial pressure calculating part that calculates an interference gas partial pressure as a partial pressure of the interference gas.

Light absorbance analysis apparatus and program record medium for recording programs of light absorbance analysis apparatus

A concentration control apparatus capable of appropriately making a zero adjustment of a concentration measurement mechanism without interrupting a semiconductor manufacturing process includes: a control valve that controls gas flowing through a lead-out flow path; a concentration measurement mechanism that measures the concentration of source gas contained in gas flowing through the lead-out flow path; a concentration controller that controls the control valve so that the deviation between measured concentration measured by the concentration measurement mechanism and preset set concentration decreases; a judgement time point determination part that determines a judgement time point that is the time point when the gas present in a measurement part where the concentration measurement mechanism performs the concentration measurement has been replaced with other gas; and a zero adjustment part that makes a zero adjustment of the concentration measurement mechanism at or after the judgement time point.

Concentration control apparatus, zero point adjustment method, and program recording medium recorded with concentration control apparatus program

An absorption spectroscopic system is provided with a detector that detects an intensity of light transmitted through a gas, a total pressure sensor that measures a total pressure of the gas, an interference gas partial pressure-absorbance relationship storage unit that stores interference gas partial pressure-absorbance relationship data, an interference gas partial pressure estimation unit that estimates the partial pressure of the interference gas based on the total pressure measured by the total pressure sensor, an interference gas absorbance conversion unit that converts an estimated partial pressure of the interference gas estimated by the interference gas partial pressure estimation unit into an absorbance of the interference gas based on the interference gas partial pressure-absorbance relationship data, and a target gas absorbance calculation unit that calculates an absorbance of the target gas based on output values from the detector and on the absorbance of the interference gas.

Absorption spectroscopic system, program recording medium for an absorption spectroscopic system and absorbance measurement method

The present invention provides a gas control system which introduces carrier gas into a tank containing a material and leads out material gas generated by vaporization of the material from the tank together with the carrier gas, the gas control system being provided with: a flow rate control unit that is configure to control the flow rate of the material gas led out from the tank by adjusting the flow rate of the carrier gas introduced into the tank; and a control limit detection unit that is configured to detect a control limit state and output detection of the control limit state, the control limit state is a state that the adjustment of the flow rate of the carrier gas performed by the flow rate control unit cannot secure the flow rate control of the material gas at a predetermined performance level.

Gas control system and film formation apparatus provided with gas control system

Provided is a concentration control apparatus that, without reducing maintainability, can shorten piping to improve responsiveness. The concentration control apparatus is one adapted to introduce carrier gas into a storage tank storing a material, and control the concentration of material gas that is led out of the storage tank as mixed gas with the carrier gas and results from vaporization of the material. Also, the concentration control apparatus includes: a first unit that controls the flow rate of the carrier gas to be introduced into the storage tank; and a second unit that detects the concentration of the material gas led out of the storage tank.

Concentration control apparatus and material gas supply system

The present invention makes it easy to control the amount of material gas led out of a tank. Accordingly, carrier gas is introduced into a tank containing a material and together with the carrier gas, from the tank, material gas produced by vaporization of the material is led out. A control part controls the flow rate of the carrier gas so that a concentration index value obtained by measuring mixed gas led out of the tank and indicating the concentration of the material gas in the mixed gas comes close to a predetermined target concentration index value. In addition, the control part controls the flow rate of the carrier gas to change at a predetermined change rate, and then controls the flow rate of the carrier gas on the basis of the deviation between the concentration index value and the target concentration index value.

Gas control system, deposition apparatus including gas control system, and program and gas control method used for gas control system

A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.

Gas control system and program for gas control system

Provided is a decomposition detecting unit that despite a simple configuration, can detect whether or not decomposition occurs in material gas resulting from the vaporization of a semiconductor material. The decomposition detecting unit includes: an NDIR type or laser absorption spectroscopy type absorbance measuring mechanism that measures first absorbance, which is absorbance at a wavelength at which a semiconductor material absorbs light, and second absorbance, which is absorbance at a wavelength at which a material produced when the semiconductor material decomposes absorbs light, of mixed gas containing material gas resulting from the vaporization of the semiconductor material; and a decomposition detection part that detects the decomposition in the material gas on the basis of the ratio between first concentration calculated on the basis of the first absorbance and the second absorbance and second concentration calculated on the basis of the second absorbance.

Decomposition detecting unit, concentration measuring unit, and concentration control apparatus

The present invention intends to provide a CpMg concentration measuring device capable of accurately measuring the concentration of CpMg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 &#x3bc;m and on the basis of the light intensity, calculate the concentration of CpMg in a material gas.

Growing community of inventors

Kyoto, Japan

Masakazu Minami