Nikon Corporation

Yokogawa Electric Corporation

Masakazu Hori

Masaki Kato

Yoshiaki Kito

Kei Nara

Kazuhiro Shimizu

Yosuke Hayashida

Mariko Yao

An exposure device that draws a pattern on a substrate by shining a beam from a light source device on substrate and scanning the beam in a main scanning direction while varying the intensity of beam according to pattern information, including: a scanning unit having a beam scanning unit that includes a polygonal mirror whereby the beam is oriented to scan the beam, and light detector for photoelectric detection of reflected light generated when beam is shined on substrate; an electro-optical element for controlling the beam's intensity modulation according to pattern information such that at least part of second pattern to be newly drawn is drawn on top of at least part of first pattern formed on substrate; and a measurement unit measuring relative positional relationship between the first and second pattern on the basis of a detection signal output by the detector while second pattern is drawn on substrate.

Pattern drawing device, pattern drawing method, and method for manufacturing device

A processing system and a device manufacturing method that can perform manufacturing of an electronic device without stopping the entire manufacturing system, even when the processing state actually implemented on a sheet substrate by a processing device differs from the target processing state. A processing system for sequentially conveying a long, flexible sheet substrate along a length direction to each of a first through a third processing device to form a predetermined pattern on the sheet substrate, wherein the first through the third processing devices implement a predetermined process relating to the sheet substrate according to setting conditions set to each processing device, and when at least one from among the states of the actual processing implemented on the sheet substrate by each of the first through the third processing devices exhibits a processing error relative to a target processing state, changes other setting conditions, separate from the setting conditions exhibiting the processing error, according to the processing error.

Processing system and device manufacturing method

A measurement device according to one aspect of the present invention includes a first controller configured to output a control signal and a second controller configured to perform a first control and then to perform a second control based on the control signal output from the first controller. The control signal designates both an input signal and a calibration signal to be converted into a digital input signal and a digital calibration signal, respectively. The input signal is input from an outside of the measurement device. The calibration signal is previously prepared. The first control is for selecting the input signal and converting the selected input signal into the digital input signal. The second control is for selecting the calibration signal and converting the selected calibration signal into the digital calibration signal and for calculating a measured value using the digital input signal converted by the first control and another digital calibration signal converted by a control performed before the first control.

Measurement device

Growing community of inventors

Tokyo, Japan

Masakazu Hori